41 - 50 of 81
sputtering target with ductility
Selling leads
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...Sputtering Target 99.5%, 99.95% D100x40mm , D65x6.35mm Purity is the main performance index of the target material, because the purity of the ...
2025-07-17 00:13:23
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...target, Ti-Al target Ti70Al30, Ti75Al25 Ti-Al target Widely used in Decorating films. Gold, silver, balck and coloful series Decorating films And ...
2025-07-17 00:13:23
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Tungsten Rhenium Sputtering Target WRe3%, WRe5%, WRe25%, WRe26% Description Tungsten Rhenium Sputtering Target Uses: Tungsten-rhenium alloy has good ...
2024-12-09 12:59:43
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Copper Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering ...
2024-12-09 12:59:43
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Copper Rotatable Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of ...
2024-12-09 12:59:43
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Copper Plate Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of ...
2025-07-17 00:13:24
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..., High-density, high temperature oxidation resistance, long service life, resistance to corrosion. The melting point of coated molybdenum ...
2025-07-17 00:13:23
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Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating Ti Sputtering Targets Information: It has a melting point of 1...
2025-07-17 00:13:23
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Nickel Sputtering Target purity 99.95%, 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials ...
2024-12-09 12:59:43
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Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ...
2024-12-09 12:59:43
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