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PVD Thin Film Coating Molybdenum Sputtering Targets

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Country/Region:china

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PVD Thin Film Coating Molybdenum Sputtering Targets

Brand Name	JINXING
Model Number	Molybdenum Sputtering Target
Certification	ISO 9001
Place of Origin	China
Minimum Order Quantity	1kg
Payment Terms	L/C, D/A, D/P, T/T, Western Union
Supply Ability	100000kgs/M
Delivery Time	10～25 work days
Packaging Details	Plywood case
Material	Molybdenum Sputtering Target
Color/Appearance	Grey, Metallic
Size	Customized
Application	PVD Coating system
Shape	round, target,disc
Grain Size	Fine Grain Size, Good density
Purity:	99.95%
Density	10.2g/cm3

Detailed Product Description

Molybdenum Sputtering Target for Thin Film Coating

Product Description:

1. Grade: Mo1,TZM,MoNb alloy.

2. Purity :> =99.95%

3. Characteristic:

Melting Point: 2610°C

Boiling Point:5560°C

Density: 10.2g/cm3

High quality, workability

4. Certificate: ISO9002

5. Product Feature: High melting point, High-density, high temperature oxidation resistance, long service life, resistance to corrosion.

The melting point of coated molybdenum sputtering target is 2610℃ and boiling point is 5560 ℃. And the purity of it can up to 99.95%.

Coated molybdenum sputtering target has a lot of advantages such as high melting point, high physical strength, high elasticity modulus, great thermal conductivity and corrosion resistance and so on.

Application:

· Electronical industry as PCB coating;

· Flat Panel Display industry as LCD coating;

· Optical coating

· Electronic semiconductor

· Sputtering material & vacuum coating;

· PVD film coating etc.

Product Name	Element	Purirty	Melting Point ℃	Density (g/cc)	Available Shapes
High Pure Sliver	Ag	4N-5N	961	10.49	Wire, Sheet, Particle, Target
High Pure Aluminum	Al	4N-6N	660	2.7	Wire, Sheet, Particle, Target
High Pure Gold	Au	4N-5N	1062	19.32	Wire, Sheet, Particle, Target
High Pure Bismuth	Bi	5N-6N	271.4	9.79	Particle, Target
High Pure Cadmium	Cd	5N-7N	321.1	8.65	Particle, Target
High Pure Cobalt	Co	4N	1495	8.9	Particle, Target
High Pure Chromium	Cr	3N-4N	1890	7.2	Particle, Target
High Pure Copper	Cu	3N-6N	1083	8.92	Wire, Sheet, Particle, Target
High Pure Ferro	Fe	3N-4N	1535	7.86	Particle, Target
High Pure Germanium	Ge	5N-6N	937	5.35	Particle, Target
High Pure Indium	In	5N-6N	157	7.3	Particle, Target
High Pure Magnesium	Mg	4N	651	1.74	Wire, Particle, Target
High Pure Magnesium	Mn	3N	1244	7.2	Wire, Particle, Target
High Pure Molybdenum	Mo	4N	2617	10.22	Wire, Sheet, Particle, Target
High Pure Niobium	Nb	4N	2468	8.55	Wire, Target
High Pure Nickel	Ni	3N-5N	1453	8.9	Wire, Sheet, Particle, Target
High Pure Lead	Pb	4N-6N	328	11.34	Particle, Target
High Pure Palladium	Pd	3N-4N	1555	12.02	Wire, Sheet, Particle, Target
High Pure Platinum	Pt	3N-4N	1774	21.5	Wire, Sheet, Particle, Target
High Pure Silicon	Si	5N-7N	1410	2.42	Particle, Target
High Pure Tin	Sn	5N-6N	232	7.75	Wire, Particle, Target
High Pure Tantalum	Ta	4N	2996	16.6	Wire, Sheet, Particle, Target
High Pure Tellurium	Te	4N-6N	425	6.25	Particle, Target
High Pure Titanium	Ti	4N-5N	1675	4.5	Wire, Particle, Target
High Pure Tungsten	W	3N5-4N	3410	19.3	Wire, Sheet, Particle, Target
High Pure Zinc	Zn	4N-6N	419	7.14	Wire, Sheet, Particle, Target
High Pure Zirconium	Zr	4N	1477	6.4	Wire, Sheet, Particle, Target

Molybdenum Sputtering Target Picture:

Product Tags: Molybdenum Sputtering Targets PVD Coating Sputtering Targets 99.95% Purity Sputtering Targets

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