HIP Process Ti75Al25 Titanium Aluminum Round Bar For Sputtering

Ti75Al25 Round Bar For Sputtering

TiAl Target 75:25
Product Name: Titanium Aluminum target 75:25 at%

Titanium Aluminum 75:25 at%
TiAl targets are produced in a meltmetallurgical process.

Application
Ti75Al25 Round Bar For Sputtering are used for wear resistant coatings, e.g. cutting tools.

Purity
Metallic purity ≥ 99.8%

Composition ratio
75:25 at%

Form of Delivery
Sputtering targets, arc cathodes, round targets up to ? 220 mm in one segment, rectangular targets up to a length of 1100 mm and a width of 200 mm in one segment.

Chemical Analysis in wt%
Fe <0.07
C <0.03
O <0.15
N <0.03
H <0.01
Tolerance of Al and Ti +/- 1 wt%

Physical Properties
Melting point: 1620°C
Density supplied: ≥ 4.18 g/cm3

Ti75Al25 Round Bar For Sputtering Picture: