HIP Process Ti75Al25 Titanium Aluminum Round Bar For Sputtering
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Ti75Al25 Round Bar For Sputtering
TiAl Target 75:25 Titanium Aluminum 75:25 at% Application Purity Composition ratio Form of Delivery Chemical Analysis in wt% Physical Properties Ti75Al25 Round Bar For Sputtering Picture: |
Product Tags: Ti75Al25 Titanium Aluminum Round Bar HIP Titanium Aluminum Round Bar HIP Ti75Al25 Round Bar |
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High Purity Zirconium Sputtering Targets Thin Film Coating |
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6.52 G/Cm3 Zirconium Sputter Target , Cylindrical Targets |
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ALTi202 TiAl Target Vacuum Melting For Decoration Coating |
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75/25 50/50 60/40 Titanium Aluminum Target Wear Resistant Coatings |
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HIP Process Ti75Al25 Titanium Aluminum Round Bar For Sputtering |
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Titanium Aluminum Alloy Sputtering Targets In Electroplating |