High Purity Titanium Aluminium Zirconium Chrome Sputtering
Target
We produce Titanium Aluminium Zirconium Chrome Sputtering Target
high quality sputtering targets pure metal, alloy and ceramic
materials.
FANMETAL Produces high-purity pure metal and alloy sputtering
targets with the highest density and smallest average grain size
for semiconductor, chemical vapor deposition (CVD) and physical
vapor deposition (PVD) display and optical applications. We
typically use vacuum melting or hot isostatic pressing (HIP) for
production. We choose the appropriate production process to create
a product that meets your specific application requirements.
Our sputtering targets are in a comprehensive range, purity levels,
shapes and sizes. For example, the most common target shapes
include circular, rectangular, annular and tubular. Depending on
the size of the target and the nature of the material, they can be
single-segmented or multi-segmented. We can customize according to
your needs.
Titanium Aluminium Zirconium Chrome Sputtering Target Specification
| Product name | Titanium target for pvd coating machine |
| Grade | Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc |
| Origin | Henan Province china |
| Titanium content | ≥99.5 (%) |
| Impurity content | <0.02 (%) |
| Density | 4.51 or 4.50 g/cm3 |
| Standard | ASTM B381; ASTM F67, ASTM F136 |
Size | 1. Round target: Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm 3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm 4. Customized is available |
| Technique | Forged and CNC Machined |
| Application | Semiconductor separation, Film coating materials, Storage Electrode
coating, Sputtering coating, Surface coating, Glass coating
industry. |
| Feature | 1. Low density, high gauge strength 2. Excellent corrosion resistance 3. Has good heat resistance 4. Excellent low temperature resistance 5. Non-magnetic and non-toxic 6. Good thermal performance |
Titanium Aluminium Zirconium Chrome Sputtering Target Picture:
| titanium sputtering target | Aluminium sputtering target | Zirconium sputtering target | chrome sputtering target |
| 99.8% | 99.99% | 99.8% | 99.8%
|
| Nitride Ceramic Sputtering Target |
| Materials | Purity | Inquiry |
| Aluminum Nitride (AlN) Sputtering targets | 2N5-3N | Inquiry |
| Chromium Nitride (Cr2N) Sputtering targets | 2N5-3N | Inquiry |
| Iron Nitride (FeN4) Sputtering targets | 3N | Inquiry |
| Niobium Nitride (NbN) Sputtering targets | 2N5 | Inquiry |
| Tantalum Nitride (TaN) Sputtering targets | 2N5 | Inquiry |
| Vanadium Nitride (VN) Sputtering targets | 2N5 | Inquiry |
| Zirconium Nitride (ZrN) Sputtering targets | 2N5 | Inquiry |
| Boron Nitride (BN) Sputtering targets | 2N5 | Inquiry |
| Germanium Nitride (Ge3N4) Sputtering targets | 3N | Inquiry |
| Hafnium Nitride (HfN) Sputtering targets | 2N5 | Inquiry |
| Silicon Nitride (Si3N4) Sputtering targets | 2N5-3N | Inquiry |
| Titanium Nitride (TiN) Sputtering targets | 2N5 | Inquiry |
| Zinc Nitride (Zn3N2)Sputtering targets | 3N | Inquiry |
