China Zirconium Bar manufacturer
JINXING MATECH CO LTD
JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel
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Zr704 Zr705 Zirconium Sputter Target For Thin Film Coating

Zr704 Zr705 Zirconium Sputter Target For Thin Film Coating

Brand Name Zirconium Sputtering Target for Thin Film Coating
Model Number plates
Certification ASTM
Place of Origin China
Minimum Order Quantity Negotiable
Price 100USD-200USd
Payment Terms L/C, T/T
Supply Ability 10ton/month
Delivery Time 10-30days
Packaging Details Standard packing
State annealed
Rm(≥)/MPa 379
Rp0.2(Pa 207
A50mm(≥)/% 16
name Zirconium Sputtering Target for Thin Film Coating
material Zr702, Zr704, Zr705
Detailed Product Description

Zirconium Sputtering Target for Thin Film Coating

 

We specializes in producing high purity Zirconium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. We specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. We also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes. Other shapes are available by request.

Zirconium Sputtering Target Picture:

 

Our Main Equipment

Vacuum electron beam furnace, vacuum induction melting furnace, forging machine, rolling mill, oil press,

vacuum annealing furnace, numerical control lathe, numerical control milling machine, machining center,

grinding machine, wire cutting, numerical control water cutting, XRF, icp-oes, metallographic detector, etc

 

 

Our Certificates

1. We are an ISO9001 certified company.

2. We've been issued SGS Report.

3. We've been awarded as a High-Tech Enterprise.

4. We've been invested by the National Fund for High-end Equipment.

Product Tags: Zr705 Zirconium Sputter Target   Zr704 Zirconium Sputter Target   Thin Film Zirconium Sputter Target  
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