China Zirconium Bar manufacturer
JINXING MATECH CO LTD
JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel
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Nickel Sputtering Targets For Commercial And Research Applications 8.9g/Cm3

Nickel Sputtering Targets For Commercial And Research Applications 8.9g/Cm3

Brand Name JINXING
Model Number Nickel Sputtering Target
Certification ISO 9001
Place of Origin China
Minimum Order Quantity 1kg
Price 20~150USD/kg
Payment Terms L/C, D/A, D/P, T/T, Western Union
Supply Ability 100000kgs/M
Delivery Time 10~25 work days
Packaging Details Plywood case
Material Nickel Sputtering Target
Process CIP, HIP Pressing
Size Customized
Application PVD Coating system
Shape Round , Plate, Tube
Grain Size Fine Grain Size, Good density
Purity: 99.95%, 99.99%, 99.999%
Density 8.9g/cm3
Detailed Product Description

Nickel Sputtering Target purity 99.95%, 99.99%, 99.999%

High purity material, ultra-high purity material, semiconductor high purity material


Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and electronic industry, high-purity materials are widely used in various industrial fields, including field luminescent covers, thermoelectronics, electronics, information, infrared, solar cells, high-performance alloys, etc. Jinxing matech supplies a full range of ultra-high purity materials to meet the needs of domestic and international customers. We not only provide high-purity raw materials, but also can make various high-purity raw materials for customers, such as ultra-high purity metal magnetron sputtering target, solar cell magnetron sputtering target, solar film evaporation coating material, electronic high-purity wire rod, strip, powder...


Sputtering target backplane supply, bonding service: the center provides a variety of sputtering target backplane, including oxygen-free copper, molybdenum, aluminum, stainless steel and other materials. At the same time, it provides the welding service between the target and the back plate.

 

Nickel Sputtering Target 99.99% ,  Nickel Sputtering Target 99.99% are available in varying sizes 

D100x40mm , D101.6x3.175mm etc

 

Product NameElementPurirtyMelting Point Density (g/cc)Available Shapes
High Pure SliverAg4N-5N96110.49Wire, Sheet, Particle, Target
High Pure AluminumAl4N-6N6602.7Wire, Sheet, Particle, Target
High Pure GoldAu4N-5N106219.32Wire, Sheet, Particle, Target
High Pure BismuthBi5N-6N271.49.79Particle, Target
High Pure CadmiumCd5N-7N321.18.65Particle, Target
High Pure CobaltCo4N14958.9Particle, Target
High Pure ChromiumCr3N-4N18907.2Particle, Target
High Pure CopperCu3N-6N10838.92Wire, Sheet, Particle, Target
High Pure FerroFe3N-4N15357.86Particle, Target
High Pure GermaniumGe5N-6N9375.35Particle, Target
High Pure IndiumIn5N-6N1577.3Particle, Target
High Pure MagnesiumMg4N6511.74Wire, Particle, Target
High Pure MagnesiumMn3N12447.2Wire, Particle, Target
High Pure MolybdenumMo4N261710.22Wire, Sheet, Particle, Target
High Pure NiobiumNb4N24688.55Wire, Target
High Pure NickelNi3N-5N14538.9Wire, Sheet, Particle, Target
High Pure LeadPb4N-6N32811.34Particle, Target
High Pure PalladiumPd3N-4N155512.02Wire, Sheet, Particle, Target
High Pure PlatinumPt3N-4N177421.5Wire, Sheet, Particle, Target
High Pure SiliconSi5N-7N14102.42Particle, Target
High Pure TinSn5N-6N2327.75Wire, Particle, Target
High Pure TantalumTa4N299616.6Wire, Sheet, Particle, Target
High Pure TelluriumTe4N-6N4256.25Particle, Target
High Pure TitaniumTi4N-5N16754.5Wire, Particle, Target
High Pure TungstenW3N5-4N341019.3Wire, Sheet, Particle, Target
High Pure ZincZn4N-6N4197.14Wire, Sheet, Particle, Target
High Pure ZirconiumZr4N14776.4Wire, Sheet, Particle, Target

 

 

Product Tags: Nickel Sputtering Targets For Commercial   Sputtering Targets For Research Applications   8.9 g/cm3 Sputtering Targets  
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