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Aluminum Al Sputtering Target 99.999% Ultra High Purity For Integrated Circuits

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Aluminum Al Sputtering Target 99.999% Ultra High Purity For Integrated Circuits

Brand Name	JINXING
Model Number	Aluminum Sputtering Target
Certification	ISO 9001
Place of Origin	China
Minimum Order Quantity	1kg
Price	10～500USD/kg
Payment Terms	L/C, D/A, D/P, T/T, Western Union
Supply Ability	100000kgs/M
Delivery Time	10～25 work days
Packaging Details	Plywood case
Material	Aluminum Sputtering Target
Process	CIP, HIP Pressing
Size	Customized
Application	PVD Coating system
Shape	Round , Plate, Tube
Grain Size	Fine Grain Size, Good density
Purity:	99.95%, 99.99%, 99.999%
Density	2.7g/cm3

Detailed Product Description

Aluminum Sputtering Target (Al) High purity 99.999%

High purity material, ultra-high purity material, semiconductor high purity material

Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and electronic industry, high-purity materials are widely used in various industrial fields, including field luminescent covers, thermoelectronics, electronics, information, infrared, solar cells, high-performance alloys, etc. Jinxing matech supplies a full range of ultra-high purity materials to meet the needs of domestic and international customers. We not only provide high-purity raw materials, but also can make various high-purity raw materials for customers, such as ultra-high purity metal magnetron sputtering target, solar cell magnetron sputtering target, solar film evaporation coating material, electronic high-purity wire rod, strip, powder...

Aluminum Sputtering Target 99.99% , Aluminum Sputtering Target 99.999% are available in varying sizes

D101.6x3.175mm , D101.6x6.35mm etc

Another important use of ultra-high purity aluminum is as wiring for integrated circuits. The trace impurities of uranium and thorium in ultra-high purity aluminum are as few as possible, because they are radioactive elements, which release α particles at all times, resulting in the failure of integrated circuits and program errors and confusion. U + Th < 5ppb (wt%) in 5n2 high purity aluminum and U + Th < 1ppb (wt%) in 5n5 ultra high purity aluminum. < 5ppb (wt%), in 5n5 ultra-high purity aluminum

5N and 5n5 large-scale plate targets are widely used in PDP and TFT-LCD flat panel displays and sputtering targets for solar cell coating.

In the field of superconductivity, ultra-high purity aluminum is used as the stabilizing material of superconducting cable.

In the field of electronics, 5N ultrapure aluminum is used to manufacture optoelectronic storage media, such as CD, CD-ROM, CD-RW, data disk or micro disk, DVD silver disk, etc., in which 5N ultrapure aluminum sputtering film is used as the light reflecting layer.

The impurity content of ultra pure aluminum is very little.

The low impurity content makes the ultra pure aluminum have some special properties.

The lower the content of impurity elements, the smaller the density of intermetallic compounds.

Use as a good conductor of electricity

The resistance in the very low temperature region is very small

High reflectivity to UV

Design freedom spread

It is highly resistant to corrosive gases and solutions

Product Name	Element	Purirty	Melting Point ℃	Density (g/cc)	Available Shapes
High Pure Sliver	Ag	4N-5N	961	10.49	Wire, Sheet, Particle, Target
High Pure Aluminum	Al	4N-6N	660	2.7	Wire, Sheet, Particle, Target
High Pure Gold	Au	4N-5N	1062	19.32	Wire, Sheet, Particle, Target
High Pure Bismuth	Bi	5N-6N	271.4	9.79	Particle, Target
High Pure Cadmium	Cd	5N-7N	321.1	8.65	Particle, Target
High Pure Cobalt	Co	4N	1495	8.9	Particle, Target
High Pure Chromium	Cr	3N-4N	1890	7.2	Particle, Target
High Pure Copper	Cu	3N-6N	1083	8.92	Wire, Sheet, Particle, Target
High Pure Ferro	Fe	3N-4N	1535	7.86	Particle, Target
High Pure Germanium	Ge	5N-6N	937	5.35	Particle, Target
High Pure Indium	In	5N-6N	157	7.3	Particle, Target
High Pure Magnesium	Mg	4N	651	1.74	Wire, Particle, Target
High Pure Magnesium	Mn	3N	1244	7.2	Wire, Particle, Target
High Pure Molybdenum	Mo	4N	2617	10.22	Wire, Sheet, Particle, Target
High Pure Niobium	Nb	4N	2468	8.55	Wire, Target
High Pure Nickel	Ni	3N-5N	1453	8.9	Wire, Sheet, Particle, Target
High Pure Lead	Pb	4N-6N	328	11.34	Particle, Target
High Pure Palladium	Pd	3N-4N	1555	12.02	Wire, Sheet, Particle, Target
High Pure Platinum	Pt	3N-4N	1774	21.5	Wire, Sheet, Particle, Target
High Pure Silicon	Si	5N-7N	1410	2.42	Particle, Target
High Pure Tin	Sn	5N-6N	232	7.75	Wire, Particle, Target
High Pure Tantalum	Ta	4N	2996	16.6	Wire, Sheet, Particle, Target
High Pure Tellurium	Te	4N-6N	425	6.25	Particle, Target
High Pure Titanium	Ti	4N-5N	1675	4.5	Wire, Particle, Target
High Pure Tungsten	W	3N5-4N	3410	19.3	Wire, Sheet, Particle, Target
High Pure Zinc	Zn	4N-6N	419	7.14	Wire, Sheet, Particle, Target
High Pure Zirconium	Zr	4N	1477	6.4	Wire, Sheet, Particle, Target

Product Tags: Aluminum Al Sputtering Target Sputtering Targets For Integrated Circuits Ultra High Purity Sputtering Targets

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Aluminum Al Sputtering Target 99.999% Ultra High Purity For Integrated Circuits

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