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hip pressing copper sputtering target
Selling leads
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... of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm The content of gas elements (C, O, N, H) is less than ...
2024-12-09 12:59:43
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...Sputtering Target Chromium sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities ...
2025-07-22 00:14:48
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...Sputtering Targets JX offers a wide range of Ti Al Sputtering Targets for decorative and/or wear resistance coatings to provide black, gold, silver...
2025-07-22 00:14:48
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... Features Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target by HIP will be higher density. The target ...
2025-07-22 00:14:48
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Sputtering Target Titanium-Aluminum Aluminum titanium (AlTi) alloy sputtering targets are produced by HIP technology and are widely used in tool ...
2025-07-22 00:14:48
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Tungsten Sputtering Target Tungsten target, WTi sputtering target , The tungsten sputtering target is an important substrate for the tungsten oxide ...
2025-07-22 00:14:48
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... of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm The content of gas elements (C, O, N, H) is less than ...
2024-12-09 12:59:43
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... of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm The content of gas elements (C, O, N, H) is less than ...
2025-07-22 00:14:48
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Copper Granular Ultra high purity 99.999%, 99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of ...
2024-12-09 12:59:43
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Titanium Silicon Sputtering Target (TiSi) alloy 85:15/ 80:20 / 75:25 at% TiSi sputtering target has a wide range of application prospects in machining...
2025-07-22 00:14:48
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