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High Purity Titanium Aluminum Sputtering Targets TiAl7030

High Purity Titanium Aluminum Sputtering Targets TiAl7030

Brand Name JX
Model Number High Purity Titanium Aluminum Sputtering Target TiAl7030
Certification ISO
Place of Origin China
Minimum Order Quantity 10kgs
Price USD50-100
Payment Terms L/C, T/T
Supply Ability 2ton、
Delivery Time 15days
Packaging Details Standard packing
purity High Purity Titanium Aluminum Sputtering Target TiAl7030
Shape rod
Process HIP
Size 20-250
Technics Vacuum melting
Detailed Product Description

high purity Titanium Aluminum Sputtering Target TiAl7030
To better serve you, we would like to discuss your specific requirement, Please Contact Us for a quote.

Titanium Aluminum Sputtering Target Features

Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting.
The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application.

Purity: Al-Ti 35/65 at% Al/Ti 50/50 at%, 99.95%, 99.5%
Shape: Discs, Plate, Step (Dia 300mm, Thickness 1mm) Rectangle, Sheet, Step (Length 1000mm, Width 300mm, Thickness 1mm) Tube(Diameter< 300mm, Thickness >2mm )
Application: Primary used in tools coating, Non-corrosion Valve/Chemical Plants, Marine Industry.

 

Titanium Aluminum Sputtering Target  Description

PurityAl-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AiTi 95/5wt%, AlTi 90/10wt%
ShapeDiscs, Plate, Step (Dia ≤300mm, Thickness ≥1mm)
Rectangle, Sheet, Step (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm)
Tube( Diameter< 300mm, Thickness >2mm
CertificationISO 9001:2008
SpecificationCustomized as request
ProcessForged , Rolling , Grinding
Application

1. Electroplating;

2. Chemical engineering & Petrochemical technology;

3. Medical

Density/Orgin country4.51g/cm3 /Henan province

 Titanium Aluminum Sputtering Target TiAl7030 Picture:

High pure metal sputtering target
AluminumAlpellet,round,planar,rotatable target3N~6N
ChroniumCr2N~3N5
PlatinumPt4N~5N
NickelNi4N~5N
CobaltCo3N~4N
ZirconiumZr2N2~4N
TitaniumTi4N~5N
CopperCu4N~5N
MolybdenumMo3N~4N
NiobiumNb3N5
TatalumTa4N5
TungstenW3N5
HafniumHf3N
VanadiumV2N5~3N

 

Hot Tags: tial round tial titanium-alunium target used in functional films, China, manufacturers, suppliers, factory, company, wholesale, products

 

 

 

Titanium Aluminum Alloy target/Ti-Al target Ti: Al 33:67%
TiAlFeSiMgClCMnON
46.3053.200.0750.0660.0300.0130.0160.0080.0950.003

 

Product Tags: Titanium Aluminum Sputtering Targets   High Purity Sputtering Targets   TiAl7030 Sputtering Targets  
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