High Purity Titanium Aluminum Sputtering Targets TiAl7030
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high purity Titanium Aluminum Sputtering Target TiAl7030 Titanium Aluminum Sputtering Target Features Titanium aluminum alloy sputtering target can be made by two ways,
HIP and melting. Purity: Al-Ti 35/65 at% Al/Ti 50/50 at%, 99.95%, 99.5%
Titanium Aluminum Sputtering Target Description
Titanium Aluminum Sputtering Target TiAl7030 Picture:
Hot Tags: tial round tial titanium-alunium target used in functional films, China, manufacturers, suppliers, factory, company, wholesale, products
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Product Tags: Titanium Aluminum Sputtering Targets High Purity Sputtering Targets TiAl7030 Sputtering Targets |
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