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High Purity Titanium Aluminum Sputtering Targets TiAl7030

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High Purity Titanium Aluminum Sputtering Targets TiAl7030

Brand Name	JX
Model Number	High Purity Titanium Aluminum Sputtering Target TiAl7030
Certification	ISO
Place of Origin	China
Minimum Order Quantity	10kgs
Price	USD50-100
Payment Terms	L/C, T/T
Supply Ability	2ton、
Delivery Time	15days
Packaging Details	Standard packing
purity	High Purity Titanium Aluminum Sputtering Target TiAl7030
Shape	rod
Process	HIP
Size	20-250
Technics	Vacuum melting

Detailed Product Description

high purity Titanium Aluminum Sputtering Target TiAl7030
To better serve you, we would like to discuss your specific requirement, Please Contact Us for a quote.

Titanium Aluminum Sputtering Target Features

Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting.
The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application.

Purity: Al-Ti 35/65 at% Al/Ti 50/50 at%, 99.95%, 99.5%
Shape: Discs, Plate, Step (Dia 300mm, Thickness 1mm) Rectangle, Sheet, Step (Length 1000mm, Width 300mm, Thickness 1mm) Tube(Diameter< 300mm, Thickness >2mm )
Application: Primary used in tools coating, Non-corrosion Valve/Chemical Plants, Marine Industry.

Titanium Aluminum Sputtering Target Description

Purity	Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AiTi 95/5wt%, AlTi 90/10wt%
Shape	Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm) Tube( Diameter< 300mm, Thickness >2mm
Certification	ISO 9001:2008
Specification	Customized as request
Process	Forged , Rolling , Grinding
Application	1. Electroplating; 2. Chemical engineering & Petrochemical technology; 3. Medical
Density/Orgin country	4.51g/cm3 /Henan province

Titanium Aluminum Sputtering Target TiAl7030 Picture:

High pure metal sputtering target
Aluminum	Al	pellet,round,planar,rotatable target	3N~6N
Chronium	Cr		2N~3N5
Platinum	Pt		4N~5N
Nickel	Ni		4N~5N
Cobalt	Co		3N~4N
Zirconium	Zr		2N2~4N
Titanium	Ti		4N~5N
Copper	Cu		4N~5N
Molybdenum	Mo		3N~4N
Niobium	Nb		3N5
Tatalum	Ta		4N5
Tungsten	W		3N5
Hafnium	Hf		3N
Vanadium	V		2N5~3N

Hot Tags: tial round tial titanium-alunium target used in functional films, China, manufacturers, suppliers, factory, company, wholesale, products

Titanium Aluminum Alloy target/Ti-Al target Ti: Al 33:67%
Ti	Al	Fe	Si	Mg	Cl	C	Mn	O	N
46.30	53.20	0.075	0.066	0.030	0.013	0.016	0.008	0.095	0.003

Product Tags: Titanium Aluminum Sputtering Targets High Purity Sputtering Targets TiAl7030 Sputtering Targets

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