PVD Coating Chromium Sputtering Targets Round / Tube / Plate Shape

• Description

Chromium Sputtering Target, Chromium Target are available in varying sizes 

The traditional sintering process of high purity chromium sputtering target prepared by powder metallurgy is analyzed and optimized. The experimental results show that the target density can be effectively guaranteed by processing the sputtering target with "mould pressing + sintering" or "cold isostatic pressing + sintering" and controlling the sintering temperature reasonably.

Sizes:

Plate sputtering targets:

Thickness: 0.04 to 1.40" (1.0 to 35mm).

Width up to 20"(50 to 500mm).

Length: 3.9" to 6.56 feet( 100-2000mm)

other sizes as requested.

Cylinder sputtering targets:

3.94 Dia. x 1.58"(100 Dia. x 40mm)

2.56 Dia. x 1.58" (65 Dia. x 40mm)

or 63*32mm other sizes as requested.

Tube sputtering targets:

2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)

3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)

other sizes as requested.