1 - 10 of 23
fine grain size sputtering target
Selling leads
|
Tungsten Sputtering Target Tungsten target, WTi sputtering target , The tungsten sputtering target is an important substrate for the tungsten oxide ...
2025-07-22 00:14:48
|
|
High purity Titanium Sputtering Target 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials ...
2024-12-09 12:59:43
|
|
Copper Granular Ultra high purity 99.999%, 99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of ...
2024-12-09 12:59:43
|
|
... are well known and extensively used in PVD coating field because of the high purity, fine grain sizes, homogeneous microstructure, excellent ...
2025-07-22 00:14:48
|
|
... field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions. Zirconium ...
2024-12-09 13:25:36
|
|
...Sputtering Target We produce Titanium Aluminium Zirconium Chrome Sputtering Target high quality sputtering targets pure metal, alloy and ceramic ...
2025-07-22 00:14:48
|
|
...Sputtering Target for Thin Film Coating We specializes in producing high purity Zirconium Sputtering Targets with the highest possible density and ...
2025-07-22 00:14:48
|
|
Sputtering Target Titanium-Aluminum Aluminum titanium (AlTi) alloy sputtering targets are produced by HIP technology and are widely used in tool ...
2025-07-22 00:14:48
|
|
...smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and ...
2025-07-22 00:14:48
|
|
...Sputtering target for PVD Vacuum Coating Planar Sputtering target for PVD vacuum coating machine is widely used in Multi-arc ion or Magnetron ...
2024-12-09 13:16:48
|