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high purity titanium sputtering targets
Selling leads
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... in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Specification Composition ...
2025-07-16 00:11:58
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... process. Application TiAl targets are used for wear resistant coatings, e.g. cutting tools. Purity Metallic purity ≥ 99.8% Composition ratio 75:25 ...
2025-07-16 00:11:59
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Titanium Aluminum Alloy Targets Titanium Aluminum Alloy Targets, application areas: coating industry, electron tube grids, high-temperature components ...
2025-07-16 00:11:59
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...Sputtering Target, Ni Sputter Target, Ni Target, Nickel Sputtering Target, Nickel Sputter Target, Nickel Target Purity: 99.9%, 99.95%, 99.99%, 99...
2024-12-09 13:27:40
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...directly related to the target preparation process. The ordinary smelting method usually used in the preparation of metal alloys. However, this ...
2025-07-16 00:11:59
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...Sputtering Target for Thin Film Coating We specializes in producing high purity Zirconium Sputtering Targets with the highest possible density and ...
2025-07-16 00:11:58
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...Titanium Alloy Sputtering Target Description PVD coating technology physically converts a material from a solid state to a gaseous state, which is ...
2024-12-09 22:39:45
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... field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions. Zirconium ...
2024-12-09 13:25:36
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...temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Tungsten Sputtering Targets Information Tungsten Sputtering Targets Purity: 99...
2025-07-16 00:11:58
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... for integrated circuits. Purity: 99.999% ~ 99.9999% For precise control of impurity content, Ag content can be controlled below 0.1ppm and s ...
2024-12-09 12:59:43
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