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copper rotatable sputtering target
Selling leads
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... of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm The content of gas elements (C, O, N, H) is less than ...
2024-12-09 12:59:43
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...Rotatable Sputtering Target Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary ...
2024-12-09 12:59:43
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... of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm The content of gas elements (C, O, N, H) is less than ...
2025-07-22 00:14:48
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...Target Magnetron sputtering target Diameter 140mm/D60mm /57mm Zirconium target for PVD coating systerm, coating target, multi-arc target, ...
2025-07-22 00:14:48
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Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron high purity Rotatory Titanium sputtering ...
2025-07-22 00:14:48
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... of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm The content of gas elements (C, O, N, H) is less than ...
2024-12-09 12:59:43
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Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating Ti Sputtering Targets Information: It has a melting point of 1...
2025-07-22 00:14:48
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Copper Granular Ultra high purity 99.999%, 99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of ...
2024-12-09 12:59:43
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... grade and alloy 5. by request 6.Type: plane target, step target, rotating target 7.Standard: national standard, American standard, German standard ...
2025-07-22 00:14:48
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...Sputtering Target, Ni Sputter Target, Ni Target, Nickel Sputtering Target, Nickel Sputter Target, Nickel Target Purity: 99.9%, 99.95%, 99.99%, 99...
2024-12-09 13:27:40
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