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copper plate sputtering target
Selling leads
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... of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm The content of gas elements (C, O, N, H) is less than ...
2026-07-31 00:21:56
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... of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm The content of gas elements (C, O, N, H) is less than ...
2024-12-09 12:59:43
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... alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. ...
2024-12-09 12:59:43
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...Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare large-scale high...
2024-12-09 12:59:43
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Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high ...
2026-07-31 00:21:56
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...Sputtering Target Zirconium sputtering target for PVD coating systerm, coating target, multi-arc target, sputtering target, vacuum coating target. ...
2024-12-09 12:59:43
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... Target, Zirconium Target are available in varying sizes Grades: R60702, 99.2%min Purity: 99.5% Purity: 99.95% Hf
2024-12-09 12:59:43
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...Sputtering Target, Ni Sputter Target, Ni Target, Nickel Sputtering Target, Nickel Sputter Target, Nickel Target Purity: 99.9%, 99.95%, 99.99%, 99...
2024-12-09 13:27:40
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... of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm The content of gas elements (C, O, N, H) is less than ...
2024-12-09 12:59:43
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... Sputtering Targets Product Description XINXIANG FANMETAL in produce high quality sputtering target, ceramic target, metal target. The products are ...
2026-07-31 00:21:56
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