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Copper Plate Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of ...
2025-07-22 00:14:48
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Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating Ti Sputtering Targets Information: It has a melting point of 1...
2025-07-22 00:14:48
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Nickel Sputtering Target purity 99.95%, 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials ...
2024-12-09 12:59:43
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Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ...
2024-12-09 12:59:43
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Aluminum Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare ...
2024-12-09 12:59:43
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Nickel Plate Sputtering Target high purity 99.95%, 99.99%, High purity material, ultra-high purity material, semiconductor high ...
2024-12-09 12:59:43
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...99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and ...
2024-12-09 12:59:43
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High purity Titanium Sputtering Target 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials ...
2024-12-09 12:59:43
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High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the ...
2025-07-22 00:14:48
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Chromium Evaporation Material 99.5%, 99.9%, 99.95% Evaporation coating is to heat the evaporated material with evaporator under vacuum or atmosphere ...
2025-07-22 00:14:48
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