Zirconium Zr702 High Purity Metal Sputtering Targets
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High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good corrosion resistance in nitric acid not more
than 90% below 200℃. However, the stress corrosion cracking
sensitivity of zirconium in nitric acid should be noted.
Applications Of Zirconium Sputtering Target Zirconium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Sizes:
Plate sputtering targets:
Thickness: 0.04 to 1.40" (1.0 to 35mm). Width up to 20"(50 to 500mm). Length: 3.9" to 6.56 feet( 100-2000mm) other sizes as requested. Cylinder sputtering targets:
3.94 Dia. x 1.58"(100 Dia. x 40mm) 2.56 Dia. x 1.58" (65 Dia. x 40mm) or 63*32mm other sizes as requested.
Tube sputtering targets:
2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L) 3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L) other sizes as requested. |
| Product Tags: High Purity Metal Sputtering Targets Zirconium Sputtering Targets Zr702 Sputtering Targets |
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