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cnc zirconium sputtering target
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Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ...
2024-12-09 12:59:43
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Aluminum Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare ...
2024-12-09 12:59:43
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Nickel Plate Sputtering Target high purity 99.95%, 99.99%, High purity material, ultra-high purity material, semiconductor high ...
2024-12-09 12:59:43
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Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high ...
2025-07-14 00:12:32
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...99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and ...
2024-12-09 12:59:43
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High purity Titanium Sputtering Target 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials ...
2024-12-09 12:59:43
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...temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Tungsten Sputtering Targets Information Tungsten Sputtering Targets Purity: 99...
2025-07-14 00:12:32
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Titanium Aluminum Alloy Targets Titanium Aluminum Alloy Targets, application areas: coating industry, electron tube grids, high-temperature components ...
2025-07-14 00:12:32
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Titanium Aluminum Alloy Targets Titanium-aluminum alloy targets need to meet the requirements of purity, density, grain size, and surface finish. ...
2025-07-14 00:12:32
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Chromium Evaporation Material 99.5%, 99.9%, 99.95% Evaporation coating is to heat the evaporated material with evaporator under vacuum or atmosphere ...
2025-07-14 00:12:31
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