521 - 530 of 1172 Selling leads
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Titanium Sputtering Target 99.5%, 99.95% D100x40mm , D65x6.35mm Purity is the main performance index of the target material, because the purity of the ...
2026-06-22 00:36:58
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Copper Plate Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of ...
2026-06-22 00:36:58
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Titanium Silicon Sputtering Target (TiSi) alloy 85:15/ 80:20 / 75:25 at% TiSi sputtering target has a wide range of application prospects in machining...
2026-06-22 00:36:58
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Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material ...
2026-06-22 00:36:58
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Aluminum Chromium Sputtering Target (AlCr) alloy 70:30/ 50:50 at% After the development of sputtering coating technology in recent years, the coating ...
2026-06-22 00:36:58
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Aluminum Silicon Sputtering Target (AlSi) alloy 90:10/ 80:20 at% After the development of sputtering coating technology in recent years, the coating ...
2026-06-22 00:36:58
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Titanium Aluminum Sputtering Target (TiAl) alloy 50:50 / 70:30 at% After the development of sputtering coating technology in recent years, the coating ...
2026-06-22 00:36:58
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Aluminum Titanium Sputtering Target (AlTi) alloy 67:33 / 70:30 After the development of sputtering coating technology in recent years, the coating ...
2026-06-22 00:36:58
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Chromium Cylinder for Evaporation 99.5%, 99.9%, 99.95% Principle of evaporation coating: the physical process of evaporation coating from material ...
2026-06-22 00:36:58
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Chromium Pieces for Evaporation Material 99.5%, 99.9%, 99.95% Principle of evaporation coating: the physical process of evaporation coating from ...
2026-06-22 00:36:58
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