CsI High Vacuum Deposition System -RT-CsI950

CsI High Vacuum Deposition System is exclusively designed for CsI metallization on scintillation screens in an extremely high vacuum environment.

The CsI scintillators 200～600µm in thickness ranges with high uniformity of thickness and brightness performance.

Cesium Iodide (CsI ) Deposition characterizations:
Ultra- High Spatial Resolution of Imaging;
Fast response for sharper imaging;
Class leading edge-to-edge image areas;
Optical absorb layers or reflector layers;
Low patient X-ray dose;

Application: for security check and inspection, high energy physics education, nuclear radiaton detection and medical imagings: chest examination, mamography, dental inter oral and panoramic.
Substrates Applied: TFT glass, Fiber Optic Plate, Amorphous-carbon plate, Aluminum plate

Equipment Features:

Reliability:
24/7 days non-stop operation;
Inficon Film Thickness Controller to monitor the film thickness inline.
Temperature control accuracy: ±1 ℃, multi-stage setting, automatic temperature data recording and control
Rotary racks equipped with Servo-Motor for high accuracy and stability.

Safety:

High vacuum pump: Magnetic Suspension Molecular Pump, with nitrogen gas blowing device to avoid hazard material be exposed in the air;
All electrodes are equipped with safety protection sleeves.

Repeatability & Reproducibility:
Through high precised parameter control system,
Automated process control software and program,
User friendly operation.

Efficiency:
CsI-950A+ model is with 2-rotary rack structure based on Generation -one CsI-950 model.
Double-capacity for max. size substrate: 500 x400mm.

Technical Specifications

In addition to the RT-CsI950 equipment, we also provide its post-processing machines which to generate protective layer on the top of CsI film.

-- RTEP800, which is using the thermal evaporation coating technology. Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.