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6-INCH CONDUCTIVE SINGLE-CRYSTAL SIC ON POLYCRYSTALLINE SIC COMPOSITE SUBSTRATE

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6-INCH CONDUCTIVE SINGLE-CRYSTAL SIC ON POLYCRYSTALLINE SIC COMPOSITE SUBSTRATE

Brand Name ZMSH
Place of Origin China
Minimum Order Quantity 1
Price undetermined
Payment Terms T/T
Supply Ability 1pcs/month
Delivery Time 4weeks
Packaging Details foamed plastic+carton
Product Type Single-Crystal SiC Epitaxial Wafer (Composite Substrate)
Wafer Size 6 inches (150 mm)
Substrate Type Polycrystalline SiC Composite
Crystal Structure 4H-SiC or 6H-SiC Single Crystal
Detailed Product Description

The 6-inch Conductive Single-Crystal SiC on Polycrystalline SiC Composite Substrate

 

 

Abstract of the 6-inch Conductive Single-Crystal SiC on Polycrystalline SiC Composite Substrate

 

The 6-inch conductive single-crystal SiC on polycrystalline SiC composite substrate is a new type of semiconductor substrate structure.

 

Its core lies in bonding or epitaxially growing a single-crystal conductive SiC thin film onto a polycrystalline silicon carbide (SiC) substrate. This structure combines the high performance of single-crystal SiC (such as high carrier mobility and low defect density) with the low cost and large-size advantages of polycrystalline SiC substrates.

 

It is suitable for manufacturing high-power, high-frequency devices and is particularly competitive in cost-effective applications. Compared to traditional single-crystal SiC substrates, polycrystalline SiC substrates are prepared via sintering processes, which lowers the cost and allows for larger sizes (such as 6 inches), but their crystal quality is poorer and not suitable for high-performance devices directly.

 

Attribute Table, Technical Features, and Advantages of The 6-inch Conductive Single-Crystal SiC on Polycrystalline SiC Composite Substrate

 

Attribute Table

 

ItemSpecification
Product TypeSingle-Crystal SiC Epitaxial Wafer (Composite Substrate)
Wafer Size6 inches (150 mm)
Substrate TypePolycrystalline SiC Composite
Substrate Thickness400–600 µm
Substrate Resistivity<0.02 Ω·cm (Conductive Type)
Polycrystalline Grain Size50–200 µm
Epitaxial Layer Thickness5–15 µm (customizable)
Epitaxial Layer Doping TypeN-type / P-type
Carrier Concentration (Epi)1×10¹⁵ – 1×10¹⁹ cm⁻³ (optional)
Epitaxial Surface Roughness<1 nm (AFM, 5 µm × 5 µm)
Surface Orientation4° off-axis (4H-SiC) or optional
Crystal Structure4H-SiC or 6H-SiC Single Crystal
Threading Screw Dislocation Density (TSD)<5×10⁴ cm⁻²
Basal Plane Dislocation Density (BPD)<5×10³ cm⁻²
Step-Flow MorphologyClear and Regular
Surface TreatmentPolished (Epi-ready)
PackagingSingle wafer container, vacuum-sealed

 

Technical Features, and Advantages

 

High Conductivity:

Single-crystal SiC films achieve low resistivity (<10⁻³ Ω·cm) through doping (e.g., nitrogen doping for n-type), fulfilling low-loss requirements for power devices. 

 

High Thermal Conductivity:

SiC has more than three times the thermal conductivity of silicon, enabling effective heat dissipation suitable for high-temperature environments such as EV inverters.

 

High-Frequency Characteristics:

The high electron mobility of single-crystal SiC supports high-frequency switching, including 5G RF devices. Cost and Structural Innovations

 

Cost Reduction via Polycrystalline Substrates:

Polycrystalline SiC substrates are produced by powder sintering, costing only about 1/5 to 1/3 of single-crystal substrates, and scalable to 6 inches or larger sizes.

 

Heterogeneous Bonding Technology:

High-temperature and high-pressure bonding processes achieve atomic-level bonding between single-crystal SiC and the polycrystalline substrate interfaces, avoiding defects common in traditional epitaxial growth.

 

Improved Mechanical Strength:

The high toughness of polycrystalline substrates compensates for the brittleness of single-crystal SiC, enhancing device reliability.

 

Physical image display

 

 

Fabrication Process of the 6-inch Conductive Single-Crystal SiC on Polycrystalline SiC Composite Substrate

 

 

Polycrystalline SiC Substrate Preparation:

Silicon carbide powder is formed into polycrystalline substrates (~6 inches) via high-temperature sintering.

 

Single-Crystal SiC Film Growth:

Single-crystal SiC layers are epitaxially grown on the polycrystalline substrate using chemical vapor deposition (CVD) or physical vapor transport (PVT).

 

Bonding Technology:

Atomic-level bonding at single-crystal and polycrystalline interfaces is achieved via metal bonding (e.g., silver paste) or direct bonding (DBE).

 

Annealing Treatment:

High-temperature annealing optimizes interface quality and reduces contact resistance.

 

 

 

Core Application Areas of the 6-inch Conductive Single-Crystal SiC on Polycrystalline SiC Composite Substrate

 

 

 

 

New Energy Vehicles

- Main Inverters: Conductive single-crystal SiC MOSFETs improve inverter efficiency (reducing losses by 5% to 10%) and reduce size and weight. - On-Board Chargers (OBC): High-frequency switching characteristics shorten charging times and support 800V high-voltage platforms.

 

 

 

 

 

 

Industrial Power Supply and Photovoltaics

- High-Frequency Inverters: Achieve higher conversion efficiency (>98%) in PV systems, reducing overall system cost.

- Smart Grids: Reduce energy losses in high-voltage direct current (HVDC) transmission modules.

 

 

 

 

 

 

 

 

 

Aerospace and Defense

- Radiation-Hard Devices: Single-crystal SiC’s radiation resistance suits satellite power management modules.

- Engine Sensors: High-temperature tolerance (>300°C) simplifies cooling system design.

 

 

 

 

 

 

RF and Communications

- 5G Millimeter Wave Devices: Single-crystal SiC-based GaN HEMTs provide high-frequency and high-power output.

- Satellite Communications: Polycrystalline substrates’ vibration resistance adapt to harsh space environments.

 

 

 

 

Q&A 

 

Q:How conductive is a 6-inch conductive single-crystal SiC on a polycrystalline SiC composite substrate?

 

A:Source of Conductivity: The conductivity of single-crystal SiC is mainly achieved by doping with other elements (such as nitrogen or aluminum). The doping type can be n-type or p-type, resulting in different electrical conductivities and carrier concentrations.

 

Influence of Polycrystalline SiC: Polycrystalline SiC typically exhibits lower conductivity due to lattice defects and discontinuities affecting its conductive properties. Therefore, in a composite substrate, the polycrystalline portion may have some inhibiting effect on the overall conductivity.

 

Advantages of the Composite Structure: Combining conductive single-crystal SiC with polycrystalline SiC can potentially improve the overall high-temperature resistance and mechanical strength of the material, while also achieving the desired conductivity through optimized design in certain applications.

 

Application Potential: This composite structure is often used in high-power electronic devices and high-temperature environments because its excellent thermal and electrical conductivity make it suitable for operation under extreme conditions.

 

 

Other Related Product Recommendations

2/4/6/8 inch SiC wafer

 

Product Tags: 6-INCH Silicon Carbide Wafer   Single CrystalSilicon Carbide Wafer  
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