JINXING MATECH CO LTD: JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel

Home > Products > Sputtering Targets >

TiAl Sputtering Targets Ti50Al50 for Vacuum Coating aerospace

Browse Categories

JINXING MATECH CO LTD

Country/Region:china

Tel:86-371-18137338517

Contact Person:
Mr.ZHANG View Contact Details

TiAl Sputtering Targets Ti50Al50 for Vacuum Coating aerospace

Brand Name	Jinxing
Model Number	TiAl Sputtering Targets Ti50Al50
Certification	ISO 9001:2008
Place of Origin	China
Minimum Order Quantity	10kgs
Price	10-100USD/kg
Payment Terms	L/C, T/T
Supply Ability	10ton month
Delivery Time	10days
Packaging Details	Standard exporting package
Purity	Al-Ti (35/65at%), Al/Ti (50:50 at%)
Shape	Discs, Plate, Step
Specification	Customized as request
Process	HIP
Name	Sputtering Targets Ti50Al50

Detailed Product Description

Sputtering Targets Ti50Al50

JX specilizes in produce high quality Sputtering Targets Ti50Al50 ,sputtering target, ceramic target, metal target.
The products are applied to various fields of vacuum coating by various methods (magnetron sputtering, vacuum plating, etc.) : Scientific research, aerospace, automotive, microelectronics, integrated circuit industry, light source, optics, decoration, flat panel display industry, information storage industry, data storage and so on.

1. Metal Target
Nickel target, Titanium target, Zinc target, Chromium target, Magnesium target, Niobium target, Tin target, Aluminum target, Indium target, Iron target, Zirconium target, Silicon target, Copper target, Tantalum target, Germanium target, Silver target, Gold target, Gadolinium target, Lanthanum target, Yttrium target, Cerium target, Hafnium target, Molybdenum target, Tungsten target, Stainless steel target, Zirconium Aluminum target, Nickel Iron target, Titanium Aluminum target, Nickel Chromium target, Copper Indium Gallium Selenium target, Aluminum Silicon target, Zinc Aliminum target etc.

2. Ceramic material Target
ITO target, AZO target, IGZO target, Magnesium oxide target, Yttrium oxide target, Iron oxide target, Nickel oxide target, Chromium oxide target, Zinc oxide target, Zinc sulfide target, Cadmium sulfide target, Molybdenum sulfide target, Silicon dioxide target, Silicon monoxide target, Cerium oxide target, Zirconium dioxide target, Niobium pentoxide target, Titanium dioxide target, Molybdenum disulfide target, Hafnium dioxide target, Titanium diboride target, Zirconium diboride target, Tungsten trioxide target, Aluminum trioxide target, Tantalum pentoxide target, Magnesium fluoride target, Yttrium fluoride target, Zinc selenide target, Aluminum nitride target, Silicon nitride target, Boron nitride target, Titanium nitride target, Silicon carbide target, Lithium niobate target, Praseodymium titanate target, Barium titanate target, Lanthanum titanate target etc.

3. Alloy material Target
Titanium Aluminium Ti-Al, Aluminum Silicate Al-Si, Aluminum Titanium Al-Ti, Silver Copper Ag-Cu, Aluminum Magnesium Al-Mg, Cobalt iron boron Co-Fe-B, Copper Indium Gallium Cu-In-Ga, ferrimanganic Fe-Mn, Indium tin In-Sn, Cobalt Iron Co-Fe, Nickel Cobalt Ni-Co, Nickel Iron Ni-Fe, Nickel chromium Ni-Cr, Nickel zirconium Ni-Zr, Nickel Aluminum Ni-Al, Nickel Copper Ni-Cu, Nickel Vanadium Ni-V, Titanium tungsten Ti-W, Zinc Aluminum Zn-Al, Aluminium Titanium Boron Al-Ti-B, Aluminium Vanadium Al-V, Aluminium Scandium Al-Sc, Copper Tin Cu-Sn, Zirconium Aluminium Zr-Al, Boron Iron etc.

Sputtering Targets Ti50Al50 Picture:

Sputtering Targets Ti50Al50 Description

Purity	Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AiTi 95/5wt%, AlTi 90/10wt%
Shape	Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm) Tube( Diameter< 300mm, Thickness >2mm
Certification	ISO 9001:2008
Specification	Customized as request
Process	Forged , Rolling , Grinding
Application	1. Electroplating; 2. Chemical engineering & Petrochemical technology; 3. Medical
Density/Orgin country	4.51g/cm3 /Henan province

High pure metal sputtering target
Aluminum	Al	pellet,round,planar,rotatable target	3N~6N
Chronium	Cr		2N~3N5
Platinum	Pt		4N~5N
Nickel	Ni		4N~5N
Cobalt	Co		3N~4N
Zirconium	Zr		2N2~4N
Titanium	Ti		4N~5N
Copper	Cu		4N~5N
Molybdenum	Mo		3N~4N
Niobium	Nb		3N5
Tatalum	Ta		4N5
Tungsten	W		3N5
Hafnium	Hf		3N
Vanadium	V		2N5~3N

Titanium Aluminum Alloy target/Ti-Al target Ti: Al 33:67%
Ti	Al	Fe	Si	Mg	Cl	C	Mn	O	N
46.30	53.20	0.075	0.066	0.030	0.013	0.016	0.008	0.095	0.003

Product Tags: TiAl Sputtering Targets Ti50Al50 Sputtering Targets Vacuum Coating Sputtering Targets

Related Products

High Purity Zirconium Sputtering Targets Thin Film Coating for sale


From:	Enter your Email please. Your email is incorrect!
To:	JINXING MATECH CO LTD
Subject:	Subject is empty!
Message:	Characters Remaining: (80/3000) Please enter 20 to 3000 characters to contact this supplier!

TiAl Sputtering Targets Ti50Al50 for Vacuum Coating aerospace

TiAl Sputtering Targets Ti50Al50 for Vacuum Coating aerospace

High Purity Zirconium Sputtering Targets Thin Film Coating

6.52 G/Cm3 Zirconium Sputter Target , Cylindrical Targets

ALTi202 TiAl Target Vacuum Melting For Decoration Coating

75/25 50/50 60/40 Titanium Aluminum Target Wear Resistant Coatings

HIP Process Ti75Al25 Titanium Aluminum Round Bar For Sputtering

Titanium Aluminum Alloy Sputtering Targets In Electroplating