Titanium Aluminum Alloy Rod for Sputtering Target (TiAl) alloy
50:50/ 70:30 at%Titanium Aluminum Alloy Rod Diameter 80mm, 90mm , 100mm x L ,
which can be cutted to machine to the final size sputtering target
After the development of sputtering coating technology in recent
years, the coating technology for various materials has been very
perfect. Jinxing company provides a full range of sputtering
coating targets (including metal targets, alloy and intermediate
alloy targets, ceramic targets) to colleges and universities,
scientific research institutions, industrial and mining
enterprises.
Magnetron sputtering target material forming method: the material
forming method is selected according to the product performance and
different requirements of customers. In general, when the melting
point of materials is low, it is necessary to use vacuum melting,
casting, forging and rolling to eliminate porosity. Of course,
effective heat treatment is necessary to refine the uniform grain
material. Materials with high melting point (or materials with high
brittleness) are formed by hot pressing or hot isostatic pressing,
and some are formed by cold isostatic pressing and then sintered.
All kinds of sputtering target materials provided by our company
have proper technology, high density, uniform grain and long
service life...
Titanium Aluminum alloy rod for Sputtering Target ,
Titanium Aluminum Alloy Sputtering Target are available in varying sizes
Vacuum sputtering targets and optical coating materials are widely
used in decorative coatings, tool coatings, optical coatings, and
coated glass and flat panel display industries. The produced
sputtering target has reasonable composition design, smooth and
smooth surface, and good electrical conductivity. The working
current is stable during sputtering, and the bottom plate of the
high-resistance target is firmly applied. , Good stability, good
heat resistance, wear resistance and oxidation resistance, small
temperature coefficient of resistance and other characteristics.
The target materials are prepared according to their material
characteristics: the hot-pressing sintering process and the vacuum
melting casting process. The products have the characteristics of
high purity, excellent microstructure and high utilization rate.
The target types are: flat rectangular, tube-shaped, disc-shaped,
ring-shaped, flake-shaped, powdery, etc. The specifications and
components can also be customized according to the specific
requirements of users.
| | Density(g/cm3) | Actual density(g/cm3) | Compactness density% | Ti50Al50at% 2N8 | 3.633 | 3.62 | >99% |
| | Density(g/cm3) | Actual density(g/cm3) | Compactness density% | Ti70Al30at% 2N6 | 3.99 | 3.987 | >99% |
Other compostion: 50:50at% 80:20at% 70:30at% 40:60at% 33:67at%
The main products are :
High purity aluminum Al, high purity copper Cu, high purity
titanium Ti, high purity silicon Si, high purity gold Au, high
purity silver AG, high purity indium in, high purity magnesium mg,
high purity zinc Zn, high purity platinum Pt, high purity germanium
Ge, high purity nickel Ni, High purity tantalum TA, gold germanium
alloy Auge, gold nickel alloy auni, nickel chromium alloy NiCr,
titanium aluminum alloy TiAl, copper indium gallium alloy cuinga,
copper indium gallium selenium alloy CuInGaSe, zinc aluminum alloy
ZnAl, aluminum silicon alloy AlSi and other metal coating
materials.
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