21 - 28 of 28
99 97 molybdenum sputtering target
Selling leads|
...components of electric vacuum - Used for sputtering targets Surface: - cold rolling - grinding - washing surface - Sandblasting Specification: 0.1...
2024-12-09 20:42:10
|
|
...components of electric vacuum - Used for sputtering targets Surface: - cold rolling - grinding - washing surface - Sandblasting Specification: 0.1...
2026-05-20 00:15:40
|
|
High Purity 99.99% ITO Targets In2O3:SnO2=90:10 wt% Application In terms of application, ITO transparent conductive film glass is mainly used in LCD ...
2024-12-09 20:26:58
|
|
High Purity 99.99% ITO Targets In2O3:SnO2=90:10 wt% Application In terms of application, ITO transparent conductive film glass is mainly used in LCD ...
2024-12-09 22:00:03
|
|
... 5. Application Capacitors, high-temperature furnace parts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the ...
2024-12-09 19:37:28
|
|
... 5. Application Capacitors, high-temperature furnace parts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the ...
2024-12-09 22:00:03
|
|
...ts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one ...
2024-12-09 19:37:28
|
|
...ts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one ...
2024-12-09 22:00:03
|
