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sputtering targets
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99.5% High Purity Zirconium Sputtering Target For Pvd Coating Zirconium Sputtering Target, Zirconium Target are available in varying sizes Grades: ...
2024-12-09 22:00:03
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Aluminium-Chromiun Alloy AlCr Sputtering Targets for Vacuum Magnetic Control PVD Coating Aluminum-Chromium (AlCr) targets react with nitrogen during ...
2024-12-09 21:08:53
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99.95%-99.99% High Purity Bright Surface Tantalum Sputtering Targets 1. Product name Tantalum Target 2. Purity 99.95~99.99% 3. Standard ASTM B708 4. ...
2024-12-09 20:39:51
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High Pure 99.95% Chromium Rectangular Sputtering Targets on Sale Purity is one of the main performance indicators of the chromium target, because the ...
2024-12-09 20:30:55
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High Purity 99.99% ITO Targets In2O3:SnO2=90:10 wt% Application In terms of application, ITO transparent conductive film glass is mainly used in LCD ...
2024-12-09 20:26:58
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99.99% Aluminum Vacuum Magnetron Sputtering Used for PVD Coating Introduction: Product material 99.99% Al Specifications Round, rectangular. special...
2024-12-09 20:15:15
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99.99% Aluminum Vacuum Magnetron Sputtering Used for PVD Coating Introduction: Product material 99.99% Al Specifications Round, rectangular. special...
2024-12-09 20:04:46
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99.99% Min Magnesium Sputtering Targets Ground Material: Magnesium/Mg Available purity: 99.9%, 99.95%, 99.99% Size: customized Application: PVD ...
2024-12-09 20:04:31
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High Purity 99.999% Si Vacuum Magnetic control Sputtering Targets Specification Product name Silicon sputtering target Symbol Si sputtering target ...
2024-12-09 20:02:34
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High Purity 99.8% Vacuum Magnetic Control Titanium Sputtering Target Purity is one of the main performance indicators of the titanium target, because ...
2024-12-09 19:57:13
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