Wafer-Level Hysteresis Loop Measurement InstrumentProduct Introduction Using polar/longitudinal magneto-optical Kerr effects (MOKE), this
instrument rapidly and globally detects the magnetism of wafer
films. Non-contact measurement avoids wafer damage and is suitable
for post-patterning sample testing in spin chip production. It
provides a vertical magnetic field of up to 2.5 T and an in-plane
magnetic field of up to 1.4 T, with strong magnetic fields inducing
free and reference layer flipping in vertically anisotropic
magnetic access random memory (MRAM) film stacks. Ultra-high Kerr
detection sensitivity allows single-time characterization of subtle
magnetic changes in different film layers. Combining
laserpoint-by-point probing with scanning imaging enables rapid
creation of global wafer magnetic characteristic maps, aiding
process optimization and yield control. Equipment Performance | Equipment Performance Indicator | Description |
|---|
| Sample Size | Compatible with 12-inch and below, supports fragment testing | | Magnetic Field | Vertical ±2.4 T; In-plane ±1.3 T | | Magnetic Field Resolution | PID closed-loop feedback regulation, 0.01 mT | | Magnetic Field Uniformity | Better than ±1%@Φ1 mm | | Kerr Angle Resolution | 0.3 mdeg (RMS) | | Testing Efficiency | 12 WPH@±1.3 T /9 sites measurement/200 mm wafer | | Sample Repeatability | Better than 10 μm | | Uptime | 90% | | EFEM | Optional | | Testing Functions | Non-destructive hysteresis loop measurement of magnetic film
stacks/devices, automatic extraction of hysteresis loop information
(free layer and pinned layer Hc, Hex, M (Kerr angle value)), and
rapid mapping of wafer magnetic characteristic distribution |
Application Cases Hysteresis Loop Measurement Results of Vertical MRAM Film Stacks Hysteresis Loop Measurement Results of In-Plane Anisotropic mTJ
Film Stacks Magnetic Field Characteristic Distribution Map of 12-inch
Vertically Anisotropic Wafer |
