21 - 30 of 95
etching chamber quartz window
Selling leads|
...Quartz UGR Ring in Plasma Enhanced Chamber for 12" Wafer ICP Dry Etching Equipments A quartz UGR (Uniform Gas flow Ring) is also called Focus ...
2026-04-22 13:24:39
|
|
... fused silica, used in semiconductor manufacturing (like etching chambers) to protect equipment, provide electrical insulation, and ensure uniform ...
2026-04-22 13:24:40
|
|
...Ring to Fix Plasma Reaction Chamber for Etch Equipments A quartz buckle ring likely refers to a precision-engineered quartz component (ring/focus ...
2026-04-22 13:24:43
|
|
...Quartz Isolator Plate, Inner Baffle for Dry Etching Equipments A quartz etch baffle plate is a critical, high-purity component in semiconductor ...
2026-04-22 13:24:42
|
|
... processes that precisely remove material from wafers. Its high-purity quartz material provides chemical and thermal resistance, a contamination...
2026-04-22 13:24:39
|
|
..., particularly for plasma etching and deposition, acting as a physical barrier to shield wafers, provide electrical insulation, guide process gases...
2026-04-22 13:24:40
|
|
... as a crucial guide and barrier in etching/deposition chambers to direct gases, control plasma, and protect wafers from contamination while ...
2026-04-22 13:24:42
|
|
...ring made of quartz (silicon dioxide) used in plasma processing chambers to protect semiconductor wafers from plasma damage, control gas flow, ...
2026-04-22 13:24:43
|
|
...quartz pin for etcher equipment is a high-purity, synthetic, or fused silica component used to support, lift, or position semiconductor wafers ...
2026-04-22 13:25:08
|
|
...quartz moving ring (or focus ring/shadow ring) in semiconductor etching guides reactive gases, confines the plasma to the wafer's surface for ...
2026-04-22 13:24:38
|
