CVD Chemical Vapor Deposition Furnace 1000 Ordm C Melting Heating Furnace
|
Detailed Product Description
Mbf100-10 Type Chemical Vapor Deposition CVD Furnace 1000 ordm C
Melting Furnace Heating Furnace ISO Certified Electric Fuel 1.Equipment Name and Model: MBF100-10 Type Chemical Vapor Deposition Furnace. The MBF100-10 Type Chemical Vapor Deposition (CVD) Furnace is suitable for medium-temperature heat treatment of electronic products. It is primarily used for gas-phase reaction processes of related materials in atmospheres of nitrogen, helium, acetylene, and hydrogen. It can also be utilized for sintering processes of related materials under protective atmospheres. 2.Technical Specifications and Basic Configuration
4. Facility Requirements 4.1 Environmental conditions: Temperature 0 - 40ºC, humidity ≤ 80% RH, no corrosive gas, no strong airflow disturbance. 4.2 Ground requirements: level, no obvious vibration, bearing capacity > 500Kg/m2 . 4.3 Power conditions: capacity greater than 22kVA, 3 phases 5 lines, voltage 220/380V, frequency 50Hz(according to local situation). Live wire: yellow, green, red, neutral wire: blue, ground wire: yellow-green; 4.4 Installation site: 1500mm×1500mm×3000mm (W×H×D), installation area greater than 2.5m2. |
||||||||||||||||||||||||||||||||||||||
Product Tags: Heating chemical vapor deposition furnace 1000 Ordm chemical vapor deposition furnace 1000 Ordm cvd furnace |
Related Products
![]() |
Hbf52-17 Type High-Temperature Box Furnace, Made in China |
![]() |
The Hbf52-17o High-Temperature Box Furnace Is Widely Used in The High-Temperature Sintering Process of Electronic Devices. |
![]() |
HBF52-17 type high-temperature box furnace, used for sintering ceramic filters |
![]() |
HBF52-17 type high-temperature box furnace |
![]() |
Nitrogen Atmosphere High Temperature Box Furnace Chemical Vapor Deposition CVD Furnace |
![]() |
CVD Chemical Vapor Deposition Furnace 1000 Ordm C Melting Heating Furnace |
Email to this supplier