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Specifications: Thickness range: 2-40mm PPI range: 10-140 Porosity: 95-98% Hole rate: ≥98% Aperture: 0.3mm-7mm (10-140ppi) Surface density: 100-5000 g...
2024-12-09 12:07:45
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Specifications: Thickness range: 1-40mm PPI range: 10-140 Porosity: 95-98% Hole rate: 98% Aperture: 0.3mm-7mm (10-140ppi) Surface density: 100-15000g...
2024-12-09 12:07:45
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Specifications: Thickness range: 0.8-10MM PPI range: 30-140 Porosity: 95-98% Hole rate:≥98% Aperture: 0.3mm-7mm (10-140ppi) Surface density: 100-2000 ...
2024-12-09 12:07:45
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2 inch Free-Standing GaN Substrates Dimensions:Ф 50.8 mm ± 1 mm Thickness:350 ± 25 µm Useable Surface Area:> 90% Orientation:C-plane (0001) off angle ...
2024-12-09 12:07:45
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2 inch AlN Templates: Dimensions:Ф 50.8 mm ± 0.1 mm Substrate:Sapphire (Single Side Polished) Thickness:4 ~ 5 µm Orientation:C-plane (0001) ± 1° ...
2024-12-09 12:07:45
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2 inch GaN Templates: Dimensions:Ф 50.8mm ± 0.1mm Thickness:4 µm, 20 µm; 4 µm Orientation:C-plane(0001) ± 0.5° Conduction Type:N-type(Undoped); N-type...
2024-12-09 12:07:45
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The tungsten crucible is used in the growth of sapphire single crystal, the melting of quartz glass, the vacuum coating and the rare earth smelting. ...
2024-12-09 12:07:45
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Main parameter index: 1. arc smelting chamber: vertical cylindrical vacuum chamber, double layer water-cooling, size Φ300X350mm; 2. vacuum system: ...
2024-12-09 12:07:45
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Main parameter index: 1.: the ultimate vacuum coating chamber is ≤6.6X10-5Pa; the pumping time: 30 minutes is better than 8X10-4Pa 2. target: 4 feet ...
2024-12-09 12:07:45
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Main parameter index: 1. equipment: deposition chamber, molecular pumping system, upper and lower electrodes, gas path system, power supply and ...
2024-12-09 12:07:45
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