MF Sputtering Pvd Coating System , High Uniformity Films Vacuum Deposition Machine

 The advantages:

PVD sputtering + Ion Plating give a combination of advantages like no other can:
1. Economically efficient, generating the thinnest, most uniform coating films;
2. A dry coating process at low temperature in a vacuum chamber;
3. Offers great versatility and can be used for the deposition of conductive or non-conductive materials on any type of substrates, like: metals, ceramics, plastic materials.
4. Multi-layered coating are simple to produce. 5. Fast deposition rates and high quality surface finishes.

Coating technology:

RTAC-SP Standard Specifications

TiN deposition  videos on metal parts