China PVD Vacuum Coating Machine manufacturer
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MF Magnetron Sputtering PVD Vacuum Coating Machine, TiN MF Sputtering Deposition Unit

MF Magnetron Sputtering PVD Vacuum Coating Machine, TiN MF Sputtering Deposition Unit

Brand Name ROYAL
Model Number RTAS1215
Certification CE Standard
Place of Origin Made in China
Minimum Order Quantity 1
Price Negoitable
Delivery Time 16 weeks
Packaging Details 1*40HQ
Technology MF mid-frequency magnetron sputtering
Pre-cleaning Linear Anode Ion source plasma pre-treatment
MF Sputtering Cathodes 2 pairs, 4 pieces of planar sputtering cathodes
Factory Location Shanghai city, China
Worldwide Service Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service Machine operation, maintenance, coating process Recipes, program
Warranty Limited warranty 1 year for free, whole life for machine
OEM & ODM available, we support tailor made design and fabrication
Detailed Product Description

 

PVD MF Magnetron Sputtering Coating Machine, MF Sputtering System, TiN MF Sputtering Deposition Unit

 

 

MF Mangetron Sputtering Coater RT1215-SPMF is d esigned for copper, alumunium, plastic, metal circuit board conductive film layer plating. It can condense Nano thin film on substrates. Except Ag sputtering, it can also deposit Ni, Au, Ag, Al, Cr, SS316L.

 

The RTSP1215-MF machine is installed with 2 pairs of MF sputtering cathodes on chamber, and 1 set of Anode Layer Ion source for plasma bombardment cleaning before PVD film deposition.

 

 

Ion source is original from Gencoa company, the properties:

 

1. Optimized magnetic fields to produce a collimated plasma beam at standard sputtering pressures

2. Automated regulation for the gas to maintain constant current & voltage – multi-gas auto control

3. Graphite anode and cathode to protect the substrate from contamination and provide long-life components

4. RF standard electrical insulation on all ion sources

5. In-direct cooling of anode and cathode – quick switching of parts

6. Easy switching of cathode parts to provide multiple magnetic traps for lower voltage operation, or a focused beam

7. Voltage regulated power supply with gas adjustment feedback to maintain same current at all times

 

 

RTSP1215-MF MF Sputtering Coating Equipment Layout

 

 

RTSP1215-MF MF Sputtering Coating Equipment Applications:

 

1. Available on substrates of: Plastic, Polymer, Glass and ceramic sheets, Stainless steel, Copper sheet, Aluminum board etc.

 

2. To generate Nano film like: TiN, TiC, TiCN, Cr, CrC, CrN, Cu, Ag, Au, Ni, Al etc.

 

 

RT1215-SPMF MF Sputtering Coating Equipment Design Features:

 

1. Robust design, good for limited room space

2. Easy access for maintenance and repair

3. Fast pumping system for high yield

4. CE standard electrical enclosure, UL standard is also available.

5. Accurate fabrication workmanship

6. Stable running to guarantee high quality film production.

 

Cylinder or Planar MF Sputtering Machine working status

 

 

RT1215-SPMF MF Sputtering Coating Equipment  Specifications: 

 

MODELRT1215-SPMF
MATERIALStainless Steel (S304)
CHAMBER SIZEΦ1200*1500mm (H)
CHAMBER TYPE1-door structure, Vertical
SINGLE PUMP PACKAGERotary VaneVacuum Pump
Roots Vacuum Pump
Magnetic Suspension Molecular Pump
Two-stage rotary vane vacuum pump
TECHNOLOGYMF Magnetron Sputtering, Linear Ion Source
POWER SUPPLYSputtering power supply + Bias Power supply + Ion Source
DEPOSITION SOURCE2 pairs MF Sputtering Cathodes + Ion Source
CONTROLPLC+Touch Screen
GASGas Mass Flow Meters ( Ar, N2, C2H2, O2) Argon, Nitrogen and Ethyne,Oxygen
SAFETY SYSTEMNumerous safety interlocks to protect operators and equipment
COOLINGCooling Water
CLEANINGGlow Discharge/Ion Source
POWER MAX.120KW
AVERAGE POWER CONSUMPTION70KW

 

Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

Product Tags: small pvd coating machine   vacuum coating plant  
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