The PVD Direct Plating Silver on ceramic dielectric
filters is an advanced coating technology applied with 5G base
station and other semiconductors for electronic industries.
One typical application is Ceramic Radiating Substrate. Silver /
Copper conductive film deposition on Aluminum Oxide (Al2O3), AlN
substrates by PVD vacuum sputtering technology, has above all one
big advantage compared to traditional manufacturing methods: DBC
LTCC HTCC, which has much lower production costs. Royal
Technology’s team collaborated with our customer to develop the PVD
Silver Plating process successfully applying with
sputtering technology which can replace conventional liquid silver
brushing process.
Typical Applications
- HBLED
- Substrates for solar concentrator cells
- Power semiconductor packaging including automotive motor control
- Hybrid and electric automobile power management electronics
- Packages for RF
- Microwave devices
- Ceramic dielectric filters for 5G Base station
Only to name a few, for more applications, please contact Royal
Tech.
Technical Advantages
Large Capacity
Flexible Modules Design
Precised Manufacturing
The RTAS1215 batch Sputtering system is the upgraded
version ,the newest system has several advantages:
Higher Efficient Process
1. Double sided coating is available by turnover fixture design
2. Up to 8 standard planar cathode flanges for multiple sources
3. Large capacity up to 2.2 ㎡ ceramic chips per cycle
4. Fully Automation, PLC+Touch Screen, ONE-touch control system
Lower Production Cost
1. Equipped with 2 sets magnetic suspension molecular pumps, fast
starting time, free maintenance
2. Maximum heating power
3. Octagonal shape of chamber for optimum space using, up to 8 arc
sources and 4 sputtering cathodes for fast deposition of coatings
Technical Specifications
Model: RTSP1200-DPC
Chamber Height (mm): 1500
Chamber diameter (mm): φ1200
Sputtering Cathodes Mounting Flange: 4
Ion Source Mounting Flange: 1
Arc Cathodes Mounting Flange: 8
Satellites (mm): 16 x Φ150
Pulsed Bias Power (KW): 36
Sputtering Power (KW): DC36 + MF36
Arc Power(KW): 8 x 5
Ion Source Power (KW): 5
Heating Power (KW): 36
Effective Coating Height (mm): 1020
Magnetic Suspension Molecular Pump: 2 x 3300 L/S
Roots Pump: 1 x 1000m³/h
Rotary Vane Pump: 1 x 300m³/h
Holding Pump: 1 x 60m³/h
Capacity: 2.2 ㎡
Installation Area ( L x W x H) mm: 4200*6000*3500
Insite
Built Time: Since 2016
Quantity: 3 sets
Location: China
Compared with the market huge demand, batch system's productivity
is low; we have been dedicated developing the In-line sputtering
system ( continues sputtering deposition line) with automatically
robot loading/unloading devices. Anyone who is interested in
this system, please contact our technician for more specifications.
