PECVD DLC Thin Film Vacuum Coating Equipment, Graphite sputtering deposition system

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SHANGHAI ROYAL TECHNOLOGY INC.

Country/Region:china

Tel:86-21-37635838

Contact Person:
Ms.ZHOU XIN View Contact Details

PECVD DLC Thin Film Vacuum Coating Equipment, Graphite sputtering deposition system

Brand Name	ROYAL
Model Number	RTSP
Certification	CE
Place of Origin	Made in China
Minimum Order Quantity	1 set
Price	negotiable
Payment Terms	L/C, T/T
Supply Ability	6 sets per month
Delivery Time	12 weeks
Packaging Details	Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Deposition Sources	Sputtering + PECVD
Technique	PVD, Balanced/Unbalanced Magentron Sputtering Cathode
Applications	Metal jewelry, watches, necklace, ear rings, finger rings, bracelets, handbag chains, logos
Film Features	bright colors, wear resistance, strong adhesion, decorative coating colors
Factory Location	Shanghai city, China
Worldwide Service	Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service	Machine operation, maintenance, coating process Recipes, program
Warranty	Limited warranty 1 year for free, whole life for machine
OEM & ODM	available, we support tailor made design and fabrication

Detailed Product Description

DLC Thin Film Vacuum Coating Equipment, Ion Source PECVD to Generate Diamond Like Carbon Coating System

DLC film ( Diamond - Like - Carbon), it has been benefiting variety of industries for high end quality products like: automotive bearings, medical instruments, military, aerospace, industrial sealing parts, watches, etc. which require high durability and min. coefficient of friction.

PECVD + PVD process DLC coating technique has been developed by us for years to satisfy the highest standard application. This process providing an unique and flawless finishing on the product surface except extrodiary beauty.

DLC Thin Film Coating Machine Specifications

MODEL				RTSP1010
TECHNOLOGY				PECVD process- magnetron sputtering + ion source
CHAMBER MATERIAL				Stainless Steel (S304)
CHAMBER SIZE				Φ1000*1000mm (H)
CHAMBER TYPE				Regular octahedron chamber, 2-doors
ROTATION RACK & JIG SYSTEM				6 (8)satellite, Max. weight: 400kgs
POWER SUPPLIES				Qty. of Sputtering: 224 KW Bias of Power Supply: 124W AE power supply for option Ion Source Power supply 2 sets, AE power supply for option
DEPOSITION MATERIAL				Cr/C
DEPOSITION SOURCE				2 pairs (4 pieces) Sputtering Cathodes + 2 Ion Source Coating Area: Dia800mm*H550mm; Uniformity Area: ±10~15%
CONTROL				PLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)
PUMP SYSTEM				Rotary Vane Pump: SV300B - 1 set (Leybold)
				Roots Pump: WAU1001 - 1 set (Leybold)
				Holding Pump: D60C-1set- (Leybold)
				Magnetric Rotor Suspension Molecular Pump: MAG2200 - 2 sets (Leybold)
GAS MASS FLOW CONTROLLER				3 channels, Made in America (MKS brand)
VACUUM GAUGE				Model: ZDF-X-LE, Made in China
Linear Ion Source				2 pieces Pre-treating, plasma cleaning + assisted deposition
SAFETY SYSTEM				Numerous safety interlocks to protect operators and equipment
HEATING				Heaters: 20KW. Max. temp.: 400℃
COOLING				Industrial Chiller (Cold Water)
POWER MAX.				100KW (Approx.)
AVERAGE POWER CONSUMPTION				45 KW (Approx.)
GROSS WEIGHT				T (Approx.)
FOOT PRINT				( LWH) 40004000 4000 MM
POWER ELECTRICAL				AC 380V/3 phases/50HZ

Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

Product Tags: thin film coating equipment dlc coating equipment

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