Magnetron Sputtering Deposition System
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Photonics Sputter Deposition System For Hydrophobic Composition Film And Other Functional Films
Applications:
The RTSP1213 machine is a batch model sputtering system, can deposits various hard coatings, soft coatings, compound films and solid lubricating films on the metallic and non-metallic materials substrates. Applied to industries of Hydrogen Fuel Cell vehicles, photonics products, aerospace and other new energy industries.
Properties:
To improve the conductivity of surface; High corrosion resistance; High wear resistance; High hardness Hydrophobic composition film and other functional films Available for compound coatings: metallic and non-metallic films. Film thickness range from 100nm to 12μm, thickness tolerance ±5% Low tempering parts surface hardening treatment.
Type:
Vertical orientation, polyhedron structure, 2-doors (front and back )
Features:
Technical Specifications
1. Ultimate Vacuum Pressure: better than 8.0*10-5 Pa;
3. Pumping down Time: from atm to 1.0×10-3 Pa≤15 minutes ( room temperature, dry, clean and empty chamber) 4. Deposition source: balanced/unbalanced sputtering cathodes 5. Operating Model: Full Automatically /Semi-Auto/ Manually 6. Heating: from room temperature up to max. 450℃, 7. Plasma cleaning and Plasma assist deposition: Anode Linear Ion Source 8. Magnetic Closed - Loop filed. (Unbalance/balance cathodes) 9. Bias Power supply for glow discharging.
The vacuum coating machine contains key completed system listed below:
1. Vacuum Chamber Inner Height: 1300mm 1.2 Material: Vacuum Chamber SUS304 Door and flanges SUS304 Chamber strengthen structure: SS41 mild steel, with painted finishing surface treatment. Chamber chassis SS41 mild steel with painted finishing surface treatment. 1.3 Sputtering Shield : SUS304 1.4 View Window: on chamber door - 4 sets ( 2 on each door) 1.5 Vacuum Chamber Venting Valve (including silencer) 1.6 Door: SUS304 material
2. Roughing Vacuum Pumping System:
3. High Vacuum Pumping System:
Magnetic Suspension Molecular Pump ( Leybold )
4. Electrical Control and Operation System- PLC+ Touch Screen
4.1 Main circuit: None-fuse breaker switch, electromagnetic switch, C/T in series type 4.2 Sputtering Power Supply + Ion source power supply + Bias Power Supply ( Advanced Energy ) 4.3 Sputtering deposition control system 4.4 Operation System: Touch Screen + PLC, recipe control and data logging, Auto shutdown, auto evacuation, auto coating 4.5 Measuring System Vacuum Pressure : Vacuum Gauge: Pirani + Penning gauge + Full range vacuum gauge -- Europe brand Temperature measuring device: Thermocouple 4.6 Alarm System: Compressed air pressure , Cooling water flow, Mis-operation 4.7 Power Load Indicator: Voltage indicator and load current indicator
5. Deposition System 5.1 Deposition source: Sputtering cathodes, Ion source -- Europe brand 5.2 Deposition material: Carbon target
6. Sub-System 6.1 Air Compressed Valve Control System 6.2 Cooling Water System:Water flow pipe and switch valve system
7.Working Environment Compressed Air: 5~8kg/cm2 Cooling Water: Water-In Temperature: 20~25℃, 200 Liter/min,
Power: 3 Phase 380V 50Hz(60Hz), 75kVA, average power consumption: 40KW Installation Area: (L*W*H) 3000*4000*3200mm Exhaust: Vent for mechanical pumps
Why us?
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.
To download the completed brochure, please click here: R&D vacuum coating machine - PECVD + PVD depositio... |
Product Tags: magnetron sputtering machine vacuum deposition equipment |
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