| MODEL | RTAS1000 |
| TECHNOLOGY | arc plating + magnetron sputtering + ion source |
| CHAMBER MATERIAL | Stainless Steel (S304) |
| CHAMBER SIZE | Φ1000*1000mm (H) |
| CHAMBER TYPE | Regular octahedron chamber, 2-doors |
| ROTATION RACK & JIG SYSTEM | 6 (8)satellite, Max. weight: 400kgs |
| POWER SUPPLIES | Qty. of Sputtering: 2*24 KW Bias of Power Supply: 1*24W AE power
supply for option Ion Source Power supply 2 sets, AE power supply
for option |
| DEPOSITION MATERIAL | Ti, Zr, TiAl, Cu, Au |
| DEPOSITION SOURCE | 2 pairs (4 pieces) Sputtering Cathodes + 6 arcs
Coating Area:
Dia800mm*H550mm;
Uniformity Area: ±10~15% |
| CONTROL | PLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+
semi-auto operation models) |
| PUMP SYSTEM | Rotary Vane Pump: SV300B - 1 set (Leybold) |
| Roots Pump: WAU1001 - 1 set (Leybold) |
| Holding Pump: D60C-1set- (Leybold) |
| Magnetric Rotor Suspension Molecular Pump: MAG2200 - 2 sets
(Leybold) |
| GAS MASS FLOW CONTROLLER | 3 channels, Made in America (MKS brand) |
| VACUUM GAUGE | Model: ZDF-X-LE, Made in China |
| Linear Ion Source | 2 pieces Pre-treating, plasma cleaning + assisted deposition |
| SAFETY SYSTEM | Numerous safety interlocks to protect operators and equipment |
| HEATING | Heaters: 20KW. Max. temp.: 400℃ |
| COOLING | Industrial Chiller (Cold Water) |
| POWER MAX. | 100KW (Approx.) |
| AVERAGE POWER CONSUMPTION | 45 KW (Approx.) |
| GROSS WEIGHT | T (Approx.) |
| FOOT PRINT | ( L*W*H) 4000*4000 *4000 MM |
| POWER ELECTRICAL | AC 380V/3 phases/50HZ |
