Low - E Film Magnetron Sputtering Coating Machine, R2R web metallizing system

 

  Low-E Film Web Coater Applications: electronic paper, flexible circuits, photovoltaic, medical strips, RFID (Radio Frequency Identification) and Low-E film.

 

DEPOSITION FILMS
1. Substrate material: PET, PEN, PES, PI, PC, PA,... Films
2. Substrate thickness: 15~300μm
3. Deposition methods: AC Reactive for SiO2(Dielectric); Pulsed DC for ITO (Metal & Conductor)
4. Oxide conductor TCO: ITO, AZO, IZO...
5. Metal conductor: Al, Cu, Mo, Ag...
6. Optical film: Ta2O5, Nb2O5, SiO2, TiO2...
7. Semiconductor: ZnO, InGaZnO...
8. Insulator: SiO2, SiNx, AlOx, AlNx...
9. Uniformity: ±5% Across Web

The MultiWeb Coater provides the following key features:
A. One chamber divided into multi-pressure zones to accommodate various deposition sources.
B. Multi-Source simultaneous deposition capabilities in one web pass, for multi-layer coating.
C. Reversible web winding direction enables deposition of unlimited layers without breaking vacuum.
D. Precision web handling mechanisms with edge-guide to allow multiple passes without loss of alignment. (Optional)
E. AC Invert web drive system for accurate control of multiple web speeds.
F. In-line optical and/or resistance thickness monitoring systems, to control precise deposition thickness and uniformity. (Optional)
G. Chamber is constructed of SUS304L Stainless with low out gassing components to insure deeper vacuum.
H. Vacuum pumping by a combination of turbo-molecular pump and low temperature cryogenics, to provide clean vacuum without moisture or oil contamination.