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sputtering target good density
Selling leads
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Copper Plate Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of ...
2025-07-20 00:14:52
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... plate, foil, rod, crucible, such as cylindrical shape, cup shape Purity: 99.95%, target density as high as 99% Product Description: purity: 99.95%...
2024-12-09 12:59:43
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Nickel Sputtering Target purity 99.95%, 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials ...
2024-12-09 12:59:43
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Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ...
2024-12-09 12:59:43
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Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high ...
2025-07-20 00:14:52
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...99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and ...
2024-12-09 12:59:43
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High purity Titanium Sputtering Target 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials ...
2024-12-09 12:59:43
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... to form solid film. Vacuum evaporation coating is an earlier technology and widely used. From the condition of coated particles, evaporation ...
2025-07-20 00:14:51
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Tungsten Rhenium Sputtering Target WRe3%, WRe5%, WRe25%, WRe26% Description Tungsten Rhenium Sputtering Target Uses: Tungsten-rhenium alloy has good ...
2024-12-09 12:59:43
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...temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Tungsten Sputtering Targets Information Tungsten Sputtering Targets Purity: 99...
2025-07-20 00:14:51
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