51 - 60 of 112
forged process sputtering target
Selling leads
|
Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ...
2024-12-09 12:59:43
|
|
Aluminum Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare ...
2024-12-09 12:59:43
|
|
Nickel Plate Sputtering Target high purity 99.95%, 99.99%, High purity material, ultra-high purity material, semiconductor high ...
2024-12-09 12:59:43
|
|
...99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and ...
2024-12-09 12:59:43
|
|
High purity Titanium Sputtering Target 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials ...
2024-12-09 12:59:43
|
|
High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the ...
2025-07-20 00:14:51
|
|
Tungsten Rhenium Sputtering Target WRe3%, WRe5%, WRe25%, WRe26% Description Tungsten Rhenium Sputtering Target Uses: Tungsten-rhenium alloy has good ...
2024-12-09 12:59:43
|
|
...temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Tungsten Sputtering Targets Information Tungsten Sputtering Targets Purity: 99...
2025-07-20 00:14:51
|
|
Chromium Pieces for Evaporation Material 99.5%, 99.9%, 99.95% Principle of evaporation coating: the physical process of evaporation coating from ...
2025-07-20 00:14:51
|
|
Chromium Cylinder for Evaporation 99.5%, 99.9%, 99.95% Principle of evaporation coating: the physical process of evaporation coating from material ...
2025-07-20 00:14:51
|