Pure Nickel Sputtering Target 4N 99.99%
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Overview Pure Nickel Sputtering Target is a sputtering target made of high-purity nickel with a purity of 99.99%, which is mainly used in physical deposition technology to create high uniformity and high-performance films. With its excellent conductivity, corrosion resistance, and high-temperature stability, it plays an irreplaceable role in fields such as aerospace, integrated circuit manufacturing, display devices, and new energy batteries. Our company has more than ten years of professional experience in the production and export of sputtering targets, and can also provide customers with customized titanium targets, tungsten targets, chromium targets, and other products. If you are interested, please feel free to contact us by email.
4N Nickel Advantages
Pure Nickel Sputtering Target Dimension
Nickel Sputtering Target Application
Nickel Target Process (1) Electron beam melting: Use high-energy electron beams to bombard nickel raw materials in a high vacuum environment to melt them to achieve deep purification (2) Vacuum induction melting: further removes gaseous impurities (such as oxygen, nitrogen) and controls the uniformity of the composition. (3) Casting molding: The purified high-purity nickel liquid metal is cast into solid ingots using molds. (4) Plastic processing: high-temperature forging, hot rolling, cold rolling, and warm rolling of nickel ingots to greatly refine the grains and make them uniform and dense in size. (5) Heat treatment: intermediate annealing and recrystallization annealing to ensure that the target has a stable microstructure. (6) Precision machining: Cutting, milling, drilling, and other machining according to customer requirements to achieve precise dimensional tolerances. (7) Surface treatment: After electrolytic polishing or mechanical polishing, the surface roughness is Ra≤0.2 μm to ensure that the surface is flat and there are no obvious defects.
Pure Nickel Sputtering Target Pictures
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