Ion Implantation Source Of Tungsten And Molybdenum Parts
Ion Implantation Source Of Tungsten And Molybdenum Parts is an
important process in the production of semiconductors. Implanter
systems dope wafers with foreign atoms to modify material
properties such as conductivity or crystal structure. The beam path
is the center of an implanter system. Here the ions are generated,
concentrated, greatly accelerated, and focused on the wafer at very
high speeds.
Our components and spare parts made from refractory metals help to
ensure that this process is as efficient, precise, and free of
impurities as possible.
Ion Implantation Source Of Tungsten And Molybdenum Parts
Description
we provides high quality, precision machined molybdenum and
tungsten components for processing equipment used in the
manufacture of semiconductors, including Ion Implantation, MOCVD,
CVD, PVD.
Ours manufacturing experience, expertise, and knowledge of the
molybdenum and tungsten materials enable us to provide precision
machined components that meet your specifications.
We supply tungsten, molybdenum, titanium and advanced ceramic
components and spare parts for ion implanter in OEM quality.
Our main products including cathode, arc chamber, repeller,
side/end plate and fastener in ion source of axcelis and varian
implanter worked in production processing of 12" and 16" wafer.
The high-purity tungsten-molybdenum arc chamber is the basic
guarantee for semiconductor chips. The high-performance ion source
tungsten and molybdenum parts greatly reduce the frequency of
machine maintenance and ensure the customer's production capacity,
which is the best choice for customers.
Ion Implantation Source Of Tungsten And Molybdenum Parts Picture:
Specifications Of Molybdenum Ion Implantation Components
| Size | Manufactured per drawing |
|---|
| Material | Pure Mo |
|---|
| Purity | Mo≥99.95% |
|---|
