Chromium Tube Cr Sputtering Target Silver Gray Appearance With Ductility

Chromium Tube Sputtering Target, Chromium Pipe Sputtering Target are available in varying sizes 

1. The purity of high purity chromium target is 99.5%, 99.8%, 99.95%, 99.99%

2. Common specifications of high-purity chromium target: high-purity chromium tube target, high-purity chromium ring target, length 20-400mm, diameter 50-120mm, tube thickness 5-10mm. TiO2, TiB2, Ti3O5, etc. can be plasma sprayed on the chromium tube target, customized according to your requirements.

3. Production process of high purity chromium target: hot isostatic pressing, powder metallurgy.

4. High purity chromium particles: common particle sizes are: 1-3mm, 3-5mm, 40 mesh, - 20-300 mesh, 40 × 60 × 80 × 200 × for evaporation coating, with high purity and good evaporation effect.

5. High purity chromium strip: Ø 0.3, Ø 0.5, Ø 1.0, etc.

6. Relevant parameters of high-purity chromium: Formula: Cr

7. Appearance: silver gray

8. Specification: grain, powder, target material, bar.

Through hot (cold) isostatic pressing, metal smelting and powder metallurgy, our company specializes in producing various magnetron sputtering targets: chromium target, aluminum target, copper target, silver target, zinc aluminum target, copper indium gallium selenium target, copper indium target, copper indium gallium target, germanium antimony tellurium target, lanthanum strontium manganese oxide target, iron bismuth manganese oxide target, chromium target, nickel chromium target, zinc target, aluminum target, magnesium target, hafnium target, scandium target, silicon target, silicon target, tellurium target, niobium target, tantalum target, Cobalt chromium target, aluminum iridium target, Iron chromium aluminum iridium target, boron carbide target, boron nitride target, titanium nitride target, monocrystalline silicon target, polycrystalline silicon target, silicon dioxide target, titanium dioxide target, aluminum oxide target, strontium titanate target, barium titanate target, zirconia target, hafnium oxide target, copper oxide target, manganese oxide target, magnesium oxide target, zinc oxide target, zinc sulfide target, cadmium sulfide target, boron nitride target, silicon carbide target, yttrium oxide target, zinc oxide target, strontium titanate target, Silver indium antimony tellurium alloy target, Indium Telluride target, ruthenium target, palladium target, iridium target, gold target, platinum target, silver target, osmium target, azo target, ITO target, cadmium telluride target, cadmium sulfide target, zinc telluride target, indium selenide target, copper selenide target, lanthanum strontium manganese oxide and other metal targets, alloy target, ceramic target, monocrystalline silicon substrate, silicon oxide substrate, alumina substrate, etc. Mainly according to the specific requirements of customers, we process various specifications and target materials of various ingredients. Our products are of higher quality, lower price and short delivery time. We maintain good business contacts with many domestic coating factories, coating machine manufacturers, scientific research institutions and domestic and foreign universities. At present, our company is providing customers with common growth and development space with high-quality products, systematic services and scientific management.