Ceramic Sputtering Target Indium Oxide Target

Ceramic Sputtering Target Indium Oxide Target

Product Description:
Our various ceramic targets, produced using vacuum hot-pressing sintering, feature leading technology and mature production processes. These products are primarily used in thin-film solar energy, flat-panel displays, optical coatings, semiconductors, and military applications.

Our company collaborates with numerous renowned universities and colleges, dedicated to the research and development of new materials and processes, and continues to provide high-quality target products and services to clients both domestically and internationally.

Indium Oxide Target Introduction:
Ln203 flat targets are produced using a vacuum hot-pressing sintering process. We can produce diameters up to 300mm, with thickness customizable to meet customer requirements.

Technical Parameters: Density 5.5g/cm³, Purity: 99.99-99.999%

Quality control: