Ceramic Sputtering Target Zinc Oxide Target

Ceramic Sputtering Target Zinc Oxide Target

Product Description:
Our various ceramic targets, produced using vacuum hot-pressing sintering, feature leading-edge technology and mature production processes. These products are primarily used in thin-film solar energy, flat-panel displays, optical coatings, semiconductors, and military applications.

Our company collaborates with numerous renowned domestic and international universities and is dedicated to the research and development of new materials and processes, continuously providing a wide range of high-quality target products and services to customers both domestically and internationally.

Zinc Oxide Target Introduction:

ZnO planar targets are produced using a vacuum hot-pressing sintering process. Maximum diameters of 300mm are possible, with thicknesses customizable to meet customer requirements.

Technical Parameters: Relative density: >99%, purity: 99.95%.

Applications:
Thin-film solar energy, low-emissivity glass, flat panel displays, and optical coatings.

Quality control: