133OD*125ID*2940L Include Flange Titanium Tube Target Titanium Gr2
ASTM B861-06 a The Target Material Vacuum Coating
| Name | Titanium tube target |
| Standard | ASTM B861-06 a |
Transport Package | Vacuum package in wooden case |
Origin | Baoji, Shaanxi, China |
Port of deliver | Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen
port |
| Size | φ133*φ125*2940(include flange) |
The development trend of tube target technology is closely related
to the development trend of thin film technology in downstream
industries. Vacuum coating technology is generally divided into two
categories: physical vapor deposition (PVD) technology and chemical
vapor deposition (CVD) technology.
Physical vapor deposition technology refers to the use of a variety
of physical methods under vacuum conditions, the plating materials
vaporized into atoms, molecules or separated into ions, directly
deposited on the surface of the matrix method. The preparation of
hard reactive films is mostly made by physical vapor deposition
method. It uses some physical processes, such as thermal
evaporation of substances or sputtering of atoms on the surface of
substances when bombarded by ions, to realize the controllable
transfer process of atoms from the source material to the film.
Physical vapor deposition technology has the advantages of good
film/base bonding force, uniform and compact film, controllable
film thickness, wide target materials, wide sputtering range, thick
film can be deposited, stable alloy film can be prepared and good
repeatability. At the same time, the physical vapor deposition
technology can be used as the final processing technology for HSS
and cemented carbide thin-film tools because the processing
temperature can be controlled below 500℃. Because the cutting
performance of cutting tools can be greatly improved by using
physical vapor deposition process, while developing high
performance and high reliability equipment, its application field
is expanded, especially in high speed steel, hard alloy and ceramic
tools for more in-depth research.
Chemical vapor deposition technology is the elemental gas
containing a membrane element or compound supply base, with the aid
of the gas phase or substrate on the surface of a chemical
reaction, on the matrix method of making metal or compound film,
mainly including atmospheric pressure chemical vapor deposition,
low pressure chemical vapor deposition and has both features of CVD
and PVD plasma chemical vapor deposition, etc.
Main advantages
Low density high specification strength
Custom request customization
Excellent corrosion resistance
Good heat resistance
Excellent low temperature performance
Good thermal properties
Low elastic modulus
