Product Description:
< 0.8 Um. This ensures a smooth and uniform surface for the
deposition of thin films and coatings. Additionally, our targets
have a Purity level of 99.99%, ensuring that the deposited films
and coatings have a high level of purity and quality. Our Metal
Sputtering Targets are available in a range of thicknesses, from 10
to 600mm. This makes them suitable for a wide range of
applications, from small-scale R&D to large-scale industrial
production. To ensure that our Metal Sputtering Targets reach our
customers in the best possible condition, we use advanced packaging
techniques. Each target is carefully packed and sealed to prevent
any damage or contamination during shipping. Our Metal Sputtering
Targets are compatible with various deposition techniques,
including DC and RF sputtering. They are also suitable for use with
various equipment, such as an Electrostatic Powder Coating Gun or a
Conveyor Metal Detector Machine. In conclusion, our Metal
Sputtering Targets are highly precise, reliable, and of the highest
quality. They are suitable for a wide range of applications in
various industries, including electronics, optics, and aerospace.
Contact us today to learn more about our Metal Sputtering Targets
and how they can benefit your business.
Features:
- Product Name: Metal Sputtering Target
- Technique: Forged And CNC Machined
- Surface: Polished, Anodizing
- Purity: 99.99%
- Surface Finish: Polished
- Thickness: 10-600mm
- Industrial Metal Detector Conveyor
- Alloy Steel Metal
Technical Parameters:
| Parameter | Value |
|---|
| Substrate Compatibility | Customized |
| Technique | Forged and CNC Machined |
| Surface Finish | Polished |
| Target Configuration | Single or Multiple |
| Material | Metal |
| Thickness | 10-600mm |
| Target Bonding | Indium |
| Density | Customized |
| Purity | 99.99% |
| Forming Process | Hot Isostatic Pressing(HIP) |
Applications:
1. Semiconductor Industry: Metal sputtering targets are essential in the semiconductor
industry for the deposition of thin films on silicon wafers. These
thin films are used to create transistors, capacitors, and other
electronic components. The metal sputtering targets are used in
physical vapor deposition (PVD) systems to deposit the thin films
on the silicon wafers. The targets are usually round in shape,
polished to a high surface finish, and have a thickness of
10-600mm.
2. 3D Printing: Metal sputtering targets are also used in 3D printing to produce
metal parts. The metal targets are melted using a laser or electron
beam to produce 3D printing metal powder. The powder is then used
to print metal parts layer by layer. The metal sputtering targets
used for 3D printing are usually customized according to the
specific metal required for the parts.
3. Automotive Industry: Metal sputtering targets are used in the automotive industry for
the deposition of thin films on car windows. The thin films are
used to reduce heat and glare from the sun. The metal sputtering
targets are used in PVD systems to deposit the thin films on the
car windows. The targets are usually round in shape, polished to a
high surface finish, and have a thickness of 10-600mm.
4. Hand Held Metal Detector: Metal sputtering targets are used in hand-held metal detectors
used for security screening. The targets are used to create a
magnetic field that interacts with metal objects. The interaction
produces a signal that is detected by the hand-held metal detector.
The targets used for hand-held metal detectors are usually round in
shape and have a thickness of a few millimeters.
5. Freefall Metal Detector: Metal sputtering targets are also used in freefall metal detectors
used in the food industry. The targets are used to create a
magnetic field that detects metal contaminants in food products.
The targets used for freefall metal detectors are usually round in
shape and have a thickness of a few millimeters.
Metal sputtering targets can be configured as single or multiple
targets depending on the requirements of the application. The
density of the targets can also be customized according to the
specific metal required for the application. The targets are
usually made of high-purity metals such as gold, silver, platinum,
and copper.
Customization:
Support and Services:
Our Metal Sputtering Targets are manufactured with high purity raw
materials using advanced processes to ensure consistent quality and
performance. We offer a wide variety of target sizes, shapes, and
materials to meet your specific requirements.
Our technical support team is available to assist with any
questions or issues you may encounter during the installation,
operation, or maintenance of our sputtering targets. We also
provide comprehensive training for your team to ensure proper
handling and usage of our products.
In addition, we offer a range of services to support your
sputtering process, including custom target design and fabrication,
target bonding, and target recycling. Our team of experts can work
with you to develop a customized solution that meets your unique
needs and budget.
