Sputtering Target Chromium Cr 100x40mm Hot Isostatic Pressing
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The chromium sputtering target material is produced by the advanced hot isostatic pressing (HIP) process. sputtering target include rectangular target, arc target, ring target and large aspect ratio integrally formed tube target, etc., with controllable purity and density, and fine and uniform grains , Long service life and other advantages.Purity: 99.5%~99.95%; Forming process: hot isostatic pressing(HIP); Conventional size: ID55*OD70*L, ID125*OD153*L, φ100*40mm, φ150*30mm, φ155*30, φ80*40mm, etc.; Application: decorative coating, tool coating, flat display coating, thin film solar industry, flat panel display industry, energy-saving glass industry, optical coating industry (such as automobile rearview mirror coating), etc.
Chromium 2N5 (Trace elements)PPM ≥7.12g/cm3
Chromium 2N8 (Trace elements)PPM ≥7.12g/cm3
Chromium 3N (Trace elements)PPM ≥7.12g/cm3
Chromium 3N5 (Trace elements)PPM ≥7.12g/cm3
Other targets can also be supplied
Product Advantage01 High chemical purity 02 Low gas content 03 Close to 100% density 04 Uniform grains 05 Dense and homogeneous inner structure Application FieldSolar photovoltaic industry Decorative coatings industry Flat panel display industry Architectural glass/automotive glass industry Flexible winding coating industry Optical data storage industry Optical communication/optical industry Magnetic data storage as well as semiconductor industry
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Product Tags: Metal Sputtering Chromium Target Hot Isostatic Pressing Chromium Target Rectangular Cr Planar Target |
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