The S1 High-Purity High-Temperature Resistant Quartz Tube with
dimensions of Outer Diameter Φ44mm * Inner Diameter Φ34mm * Total
Length 154mm is a premium precision tubular component manufactured
from S1 grade high-purity fused silica material through
high-temperature integrated processing. This quartz tube is
engineered to deliver exceptional performance in the most demanding
industrial environments where material purity, thermal stability,
and chemical inertness are non-negotiable operational requirements.
The S1 grade fused silica substrate features ultra-low impurity
content, minimal hydroxyl concentration, and superior optical
clarity, making it the material of choice for semiconductor
fabrication processes, photovoltaic manufacturing equipment,
precision laboratory instrumentation, high-temperature heat
treatment systems, and specialty gas delivery pipelines. The
precisely controlled dimensional specifications including uniform
wall thickness of 5mm and tight geometric tolerance control ensure
perfect compatibility with a wide range of high-temperature
furnaces, experimental apparatus, and precision pipeline
installations. Key Features- S1 Grade High-Purity Fused Silica Material: Manufactured from premium S1 grade fused silica with exceptionally
low impurity concentrations and minimal hydroxyl content, ensuring
zero metal ion precipitation that could contaminate sensitive
semiconductor wafers, photovoltaic cells, or high-purity chemical
reagents during critical manufacturing processes. The superior
material quality guarantees consistent batch-to-batch performance
for demanding OEM production environments.
- Superior High-Temperature Resistance: The fused silica construction maintains stable mechanical and
optical properties under continuous long-term high-temperature
service conditions without deformation, softening, or
devitrification. With a softening point approaching 1680℃ and
sustained operational capability exceeding 1100℃, this tube excels
in applications where ordinary borosilicate glass and common quartz
variants would fail catastrophically due to thermal degradation or
structural collapse.
- Exceptional Thermal Shock Resistance: The extremely low coefficient of thermal expansion inherent to
fused silica enables the tube to withstand rapid and extreme
temperature fluctuations without cracking, fracturing, or
developing stress-induced microstructural damage. This
characteristic is invaluable for intermittent high-temperature
experimental procedures, cyclic industrial heat treatment
processes, and applications involving repeated heating and cooling
transitions that would destroy conventional glass tubing,
significantly extending service life and reducing replacement
frequency.
- Ultimate Chemical Stability and Inertness: Exhibits outstanding resistance to chemical attack from a
comprehensive spectrum of aggressive media including concentrated
strong acids, strong alkalis, and a wide range of organic solvents.
The material remains chemically stable and non-reactive in
virtually all corrosive process environments with the sole
exception of hydrofluoric acid, providing reliable containment and
transport capability for aggressive chemical reagents in analytical
laboratories, chemical processing plants, and semiconductor wet
etching stations.
- Excellent Optical Transmittance Across Broad Spectrum: The high-purity fused silica substrate delivers superior light
transmission performance spanning ultraviolet, visible, and
near-infrared wavelength bands with exceptional optical clarity and
minimal absorption. This broadband transparency makes the tube
ideally suited for photocatalytic reaction vessels, UV disinfection
flow cells, optical detection and monitoring systems, spectroscopic
sample cells, and scientific observation applications where
simultaneous optical access and thermal stability are essential
system requirements.
- Precision Dimensions with Uniform Wall Thickness: The straight cylindrical geometry features precisely controlled
outer diameter of 44mm, inner diameter of 34mm, and consistent wall
thickness of 5mm with tight dimensional tolerances throughout the
entire 154mm length. The uniform wall thickness ensures consistent
thermal distribution, predictable flow characteristics, and
reliable mechanical integrity, enabling seamless integration with
standard high-temperature furnace assemblies, laboratory glassware
systems, and custom precision pipeline configurations without
requiring additional adapters or modifications.
- Wide Application Versatility Across Industries: The combination of S1 grade material purity, exceptional thermal
performance, chemical inertness, and standardized dimensional
specifications enables deployment across diverse high-technology
sectors including semiconductor wafer processing equipment,
photovoltaic cell manufacturing lines, new energy research
laboratories, precision chemical synthesis reactors, specialty gas
handling systems, high-temperature optical furnaces, and advanced
materials research facilities where reliability and performance
consistency are mission-critical operational priorities.
Technical Specifications| Parameter | Specification |
|---|
| Product Name | S1 High-purity High-temperature Resistant Quartz Tube | | Material Grade | S1 High-Purity Fused Silica | | Outer Diameter | Φ44mm | | Inner Diameter | Φ34mm | | Wall Thickness | 5mm | | Total Length | 154mm | | Hydroxyl Content | Low (<50 ppm typical) | | Impurity Level | Ultra-low, No Metal Ion Precipitation | | Long-term Use Temperature | Up to 1100℃ | | Softening Point | ~1680℃ | | Thermal Expansion Coefficient | 5.5 * 10⁻⁷/K | | Density | 2.2 g/cm³ | | Transmittance Range | UV, Visible, Near-IR | | Chemical Resistance | Strong Acids, Alkalis, Organic Solvents (Except HF) | | Color | Transparent / Clear |
ApplicationsThe S1 High-Purity Quartz Tube finds indispensable application
across several critical high-technology sectors. In semiconductor
manufacturing environments, it serves as a high-purity process tube
for chemical vapor deposition gas delivery lines, diffusion furnace
liners, and wet bench reagent transport conduits where material
purity directly determines wafer yield and device performance. For
the photovoltaic and new energy industry, the tube functions as a
durable high-temperature reaction chamber liner in polycrystalline
silicon production equipment, PERC cell diffusion processes, and
thin-film deposition systems operating at sustained elevated
temperatures. Precision laboratory and research facilities utilize
this tube for high-temperature tube furnace reactors, catalytic
reaction studies, controlled atmosphere heat treatment experiments,
and optical spectroscopy flow cells where simultaneous thermal
management and optical monitoring are essential. Industrial heat
treatment operations employ the tube as protective atmosphere
furnace liners, controlled cooling chambers, and specialty gas
delivery pipelines for annealing, sintering, and tempering
processes requiring oxidation-free environments. Additional
applications include semiconductor-grade gas purification systems,
analytical instrument sample introduction lines, pharmaceutical
intermediate synthesis reactors, and environmental monitoring
equipment calibration gas delivery systems. The standardized 44mm
outer diameter dimension ensures drop-in compatibility with most
commercial tube furnace systems, while custom dimensional
configurations including alternative diameters, wall thicknesses,
and lengths can be manufactured to meet specific OEM integration
requirements upon request. Packaging & Quality AssuranceEvery S1 High-Purity Quartz Tube undergoes rigorous multi-stage
quality inspection before authorization for shipment, including
precision dimensional verification using calibrated digital
micrometers and optical comparators, surface quality examination
under controlled high-intensity illumination to detect any
scratches, inclusions, or surface irregularities, material purity
certification traceable to raw material batch records and supplier
certificates of analysis, and visual clarity assessment to confirm
optical transmittance characteristics. Products are individually
separated with cleanroom-grade protective packaging materials,
wrapped in multiple layers of anti-static bubble cushioning and
high-density polyethylene foam padding, then securely enclosed in
reinforced export-quality corrugated cartons or custom-fabricated
wooden crates depending on order volume and tube dimensions. For
semiconductor-grade and high-purity applications, vacuum-sealed
packaging with desiccant inserts and Class 100 cleanroom final
packaging is available upon request to maintain pristine surface
conditions during transit and storage. Each shipment is accompanied
by a comprehensive packing list, certificate of conformity,
material test certification, and dimensional inspection report. Our
quality management system is certified to ISO 9001 international
standards with full material traceability from raw material
procurement through finished product delivery. With over 25 years
of specialized expertise in quartz glass and fused silica product
manufacturing, our dedicated technical support team provides
comprehensive pre-sales engineering consultation, custom design and
prototyping services, and responsive global after-sales technical
support. For volume OEM procurement, custom dimensional
specifications, or specialized application requirements, please
contact our sales engineering department for a tailored quotation,
production lead time estimation, and complimentary technical
evaluation support.
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