Product OverviewThe High Purity Fused Silica Quartz Substrate is a precision-ground quartz glass plate (180mm x 15mm x 5mm)
designed for high-end semiconductor, optical coating, photovoltaic,
and laboratory applications. Manufactured from premium fused silica
(SiO2 > 99.99%), this substrate delivers exceptional thermal
stability, chemical inertness, and optical clarity — making it the
preferred choice for demanding high-precision manufacturing
environments. Key Features- Ultra-High Purity: SiO2 > 99.99% with ultra-low metal impurity content. No ion
precipitation ensures contamination-free processing for
semiconductor and optical applications
- 1100°C Temperature Resistance: Withstands extreme heat without deformation or degradation, far
surpassing borosilicate glass alternatives
- HF & Strong Corrosive Resistance: Excellent chemical durability against hydrofluoric acid, strong
acids, and alkalis — ideal for aggressive wet chemical processes
- Ultra-Low Thermal Expansion: CTE of 5.5 x 10^-7 /°C prevents cracking and warping under rapid
temperature cycling
- High Transmittance: > 92% transmission across UV to visible spectrum, perfect for
optical coating and photolithography applications
- Precision Surface Finish: Precision ground and polished surfaces ensure flatness and uniform
coating deposition
Applications| Industry | Application |
|---|
| Semiconductor & Microelectronics | Wafer packaging carrier, lithography substrate, high-temperature
coating base, electronic component aging test platform | | Optics & Photoelectric | Optical thin film coating substrate, filter plate base, vacuum
coating fixture, spectrum test bench | | PV & New Energy | Solar cell coating fixture, high-temperature diffusion & PECVD
process carrier, anti-deformation substrate | | Lab & Fine Chemical | High-temperature sintering platform, HF corrosion test bench,
strong chemical reaction carrier | | Precision Instrument | Spectrometer reference substrate, optical inspection equipment
bench plate |
Competitive Advantagesvs. Borosilicate Glass: Withstands over 1100°C vs ~500°C limit; superior HF acid
resistance; 10x lower thermal expansion prevents cracking;
ultra-low metal impurity eliminates process contamination risk vs. Alumina Ceramic: High optical transparency for UV-visible applications; smoother
surface finish for uniform coating; lighter weight and easier
precision machining Specifications| Parameter | Value |
|---|
| Material | High Purity Fused Silica (SiO2 > 99.99%) | | Dimensions | 180mm (L) x 15mm (W) x 5mm (T) | | Max Operating Temperature | 1100°C | | CTE | 5.5 x 10^-7 /°C | | Transmittance | > 92% (UV-Visible) | | Chemical Resistance | HF, Strong Acid & Alkali | | Surface Finish | Precision Ground & Polished | | Metal Impurity | Ultra-Low, No Precipitation |
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