China Helium Leak Detector manufacturer
Anhui Wanyi Science and Technology Co., Ltd.
To build an enterprise with strong international competitiveness in the field of analytical and testing instruments and life and health.
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Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D

Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D

Brand Name Wayeal
Model Number SFJ-231D
Place of Origin Anhui, China
Certification CE
Minimum Order Quantity 1 Unit
Price Negotiate
Packaging Details Wooden Case
Delivery Time 35 days
Payment Terms T/T, VISA
Supply Ability 200 Units/Month
Communication Interface RS232/485, LAN
Leak rate display Numbers, Bar Charts, Graphs
User Interface 7inch Color Touch Screen
Product Name Helium Leak Detector
Mini Leak Detection Rate(Pa.m3/s)/Vaccum Mode 5*10-13 Pa.m3/s
Response Time(s) <1s
MES Interface Standard
Mini Leak Detection Rate(Pa.m3/s)/Sniffer Mode 2.5*10-9 Pa.m3/s
Detailed Product Description

Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D

Technical Parameters of Helium Leak Detector SFJ-231D

Product nameHelium leak detector SFJ-231D
Minimum detectable leak rate(Pa·m³/s)/ vacuum mode5.0*10-13 Pa·m3/s
Minimum detectable leak rate(Pa·m³/s)/ sniffer mode5.0*10-9 Pa·m3/s
Maximum allowable leak detection pressure (Pa)1500
Response time<1s
Startup time≤2min
Detectable quality2, 3,4(H2 ,He3, He4)
Man-machine interface7" color LCD touch screen
Ion source2pcs, iridium coated yttrium oxide, automatic switching
I/O Input/output interface8 inputs and 8 outputs
Communication interfaceRS232/485, USB*2
MES interfacestandard
Leak Detection portDN25KF
Power SupplyAC220V, 50Hz/60Hz
Operating temperature0~40°C
LanguageEnglish
Leakage rate displayFigure, bar chart, curve chart
Diamension645*678*965mm

Application of SFJ-231D Helium Leak Detector for the Wafer

In helium mass spectrometry leak detection technology, the application of dry pumps (oil-free dry vacuum pumps) mainly depends on the working conditions of the equipment to be inspected, the cleanliness requirements and the technical requirements of helium mass spectrometry leak detectors (e.g. Wayeal SFJ-231D).

Detection Method: Vacuum Spray Helium Method (High-Sensitivity Mode)

1: System Evacuation and Baseline Calibration

Evacuate to base pressure: Etching chamber: ≤0.1Pa (dry pump + molecular pump combination);  CVD/PVD chamber: ≤10⁻³ Pa (higher requirements for coating equipment).

Leak detector calibration: Use a standard leak reference (e.g., 1×10⁻⁷ Pa·m³/s) to calibrate the SFJ-231D and verify instrument response linearity.

Step 2: Helium Spray Detection

Detection area: O-ring grooves, bolt holes, VCR/VCO metal seals, weld joints, Ceramic insulators, copper gaskets, Bellows connections.

Helium spray operation:

Use a handheld helium spray gun (with 0.1 mm fine-tuning nozzle) at 3-5mm distance from the detection point. Move at 5cm/s speed, dwelling 2-3 seconds per point (SFJ-231D response time <1 sec). Adjust helium pressure to 0.2-0.3MPa to avoid airflow disturbance.

Step 3: Leak Point Determination and Recording

Leak rate: Semiconductor equipment allowable leak rate: Typically ≤1×10⁻⁹ Pa·m³/s (per SEMI standards).

Data recording: When the SFJ-231D displays a leak rate peak, mark the leak point with a highlighter pen.

Save leak rate curves and location data (export via USB).

Step 4: Re-inspection and Verification

Perform a second helium spray on identified leaks to confirm repeatability.

After repairing major leaks, re-evacuate to base pressure and conduct a full re-inspection.

 

Product Tags: Ultra Sensitive Helium Leak Detector   Sniffer Mode Helium Leak Detector   Graphs Display Helium Leak Detector  
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