JTC-1TRO/EDI: 1-Ton Double-Stage RO+EDI Unit for Ultrasonic Cleaning (2.5M×1.5M×2M)
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JTC-1TRO/EDI: Industry-Integrated Ultrasonic Cleaning Support
System – 1-Ton Double-Stage RO + EDI Ultrapure Water Unit Executive Summary Tailored exclusively for the ultrasonic cleaning industry, the
JTC-1TRO/EDI serves as a critical supporting component for
ultrasonic cleaning equipment, integrating a high-efficiency 1-ton
double-stage Reverse Osmosis (RO) purification system with advanced
Electrodeionization (EDI) technology. Recognizing that ultrasonic cavitation efficiency and post-cleaning residue control are directly dependent on water purity, this system delivers
consistent ultrapure water to optimize ultrasonic cleaning
performance—all within a space-efficient footprint of 2.5M×1.5M×2M,
ideal for workshop integration with existing or new ultrasonic
cleaning lines. 1. Core Technology: 1-Ton Double-Stage RO + EDI Ultrapure Water
Generation Engineered to meet the stringent water quality demands of
ultrasonic cleaning (where ionic contaminants, particulates, and
organics can compromise component cleanliness), the JTC-1TRO/EDI
adopts a three-stage purification workflow: 1.1 Pre-Treatment Train A robust pre-treatment module (multi-media filtration + activated
carbon adsorption + precision sediment filtration) removes
suspended solids (>5μm), free chlorine (<0.1ppm), and organic
compounds (TOC ≤ 3ppm). This prevents RO membrane fouling and EDI module scaling, ensuring long-term operational stability—critical for continuous
ultrasonic cleaning operations. 1.2 Double-Stage RO Purification Primary RO Stage: Achieves a 96%+ salt rejection rate, reducing total dissolved solids (TDS) from raw water to ≤ 100μS/cm. Secondary RO Stage: Further polishes permeate to conductivity ≤ 3μS/cm, eliminating residual ions that could interfere with ultrasonic cavitation or leave deposits on cleaned parts. 1.3 EDI Final Polishing The integrated EDI module utilizes continuous electrodeionization
(no chemical regeneration required) to produce ultrapure water
with: Resistivity: Up to 18.2 MΩ·cm (at 25℃) Particle Count: ≤ 5 particles/ml (≥0.1μm) Silica Content: ≤ 5ppb This meets the Class 1 water standards for precision ultrasonic
cleaning (e.g., for semiconductor wafers, medical implants, and
optical lenses). 2. Ultrasonic Cleaning Equipment Compatibility The JTC-1TRO/EDI is designed for seamless integration with all
common ultrasonic cleaning setups, delivering synchronized
ultrapure water supply for: Single/Multi-Tank Ultrasonic Cleaners: Provides low-TOC rinse water to prevent recontamination of parts post-ultrasonic cleaning, enhancing flux residue and metal fines removal. Semi-Automatic/Fully Automatic Ultrasonic Lines: Integrates with PLC control systems to match water flow with cleaning cycles (e.g., pre-rinse, ultrasonic wash, final rinse), reducing manual intervention and improving line throughput. Custom Ultrasonic Systems: Adapts to both low-frequency (28-40kHz) heavy-duty degreasing and high-frequency (80-120kHz) precision cleaning applications—its low-conductivity water minimizes electrochemical corrosion on sensitive components (e.g., PCB assemblies, titanium surgical tools). The JTC-1TRO/EDI is more than a water purification unit—it is a
purpose-built supporting system that elevates the consistency and
quality of your ultrasonic cleaning processes. By combining
industry-leading RO+EDI technology with ultrasonic equipment
compatibility, it delivers a turnkey solution for high-performance
cleaning operations. |
| Product Tags: 1-ton double-stage RO+EDI unit aerospace ultrasonic cleaner system RO+EDI unit for ultrasonic cleaning |
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JTC-1TRO/EDI: 1-Ton Double-Stage RO+EDI Unit for Ultrasonic Cleaning (2.5M×1.5M×2M) |
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