1 Ton Two-Stage Reverse Osmosis EDI Ultrapure Water Machine (DI
EDI)
—— High-precision cleaning water solutions
Product positioning
The high-purity water treatment equipment specially designed for
the ultrasonic cleaning industry integrates the core technology of
two-stage reverse osmosis (RO) continuous electrodesalination (EDI)
to achieve 1 ton/hour ultrapure water output, and the water quality
meets the electronic grade standard (resistivity ≥ 18.2MΩ・cm,
TOC≤5ppb, particle size ≤0.1μm). It is suitable for high-precision
scenarios such as semiconductor wafer cleaning, medical appliance
disinfection, and optical lens coating, solves the problems of
traditional single-stage filtration water fluctuation and
cumbersome chemical regeneration, provides stable and reliable
ultrapure water guarantee for ultrasonic cleaning, and
significantly improves the cleaning yield (such as reducing the
defective rate of semiconductor wafer particles by 70%).
Core technical advantages
1. Two-stage reverse osmosis (RO) pretreatment system
1. Three-stage progressive filtration
Processing phase
Core components
Technical parameters
Purifying effect
pretreatment
5μm PP filter cartridge activated carbon softening resin
Filtration accuracy ≤5μm, residual chlorine removal rate > 99%
Removes sediment, organic matter, calcium and magnesium ions and
protects the RO membrane
Level 1 RO
Dow BW30-400 membrane element
Salt removal rate ≥ 99.5% and recovery rate 60%
Removes more than 99% of ionic and small molecule contaminants
Secondary RO
Japan Toray TM720D membrane element
The salt rejection rate ≥ 99.9%, and the resistivity ≥ 10 MΩ・cm
Deep removal of primary RO residual ions provides a high-quality
water source for EDI
2. Intelligent anti-fouling technology
Pulsed automatic flushing:
▶ Automatic flushing of the membrane surface during shutdown (30
seconds) and low pressure flushing mode (pressure ≤ 0.3MPa) extend
the membrane element life to 3 years (2 years for conventional
equipment)
▶ The conductivity sensor monitors the quality of the RO permeate
in real time, and automatically initiates chemical cleaning when
the standard is exceeded (citric acid/sodium bisulfite, frequency ≤
2 times/year)
Energy-efficient design:
✔ Inverter pump set (power adjustment range 30%-100%), energy
consumption per ton of water ≤ 0.8kWh (conventional equipment ≥
1.2kWh)
✔ Brine recovery system: Secondary RO brine is returned to the
front end of primary RO, and the water utilization rate is
increased to 75% (far exceeding the industry standard of 50%)
2. EDI ultrapure water system (continuous electrodesalination
technology)
1. Deep desalination without chemical regeneration
Electrically driven ion migration:
▶ 0.6-1.2A constant current drive for deep ion removal (Na⁺/K⁺
residue<1ppb, Cl⁻<0.5ppb)
▶ The resistivity is stabilized at 18.2 MΩ・cm (25°C) in real time,
which meets the requirements of the SEMI E1.1 standard for
semiconductor cleaning water
Long-term resin management:
✔ IONPURE IX-30 FILM STACK IN THE UNITED STATES WITH 20% MORE RESIN
FILLING AND ≥ 5 YEARS SERVICE LIFE (3 YEARS FOR CONVENTIONAL EDI
STACKS)
✔ Automatic current compensation algorithm: dynamically adjust the
voltage according to the resistivity of the inlet water (accuracy
±1V) to ensure that the permeate water quality fluctuates by <1%
2. Zero-emission eco-friendly design
Brine Recycling:
▶ Concentrated water (resistivity≥50 kΩ・cm) can be used as rinse
water for ultrasonic cleaners, reducing wastewater discharge by 60%
▶ Equipped with a pH adjustment device (accuracy ±0.1), the pH of
the concentrated water is controlled at 6-8, and it is directly
connected to the reclaimed water system in the plant
Acid-base regeneration:
✔ Abandon the traditional mixed-bed chemical regeneration, avoid
the risk of hydrochloric acid/caustic soda storage, and comply with
GB 31573-2015 "Emission Standard for Pollutants in Inorganic
Chemical Industry"
